Abstract
ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400 °C for 1 h leads to the oxidation of Zn forming ZnO film. The photo-catalytic properties of the ZnO/Zn and ZnO films for the degradation of Rhodamine 6G dye were then compared. ZnO/Zn film has higher degradation rate of 1.37%/min while ZnO film has 1.23%/min.
Original language | English |
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Pages (from-to) | 197-200 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 624 |
DOIs | |
State | Published - Feb 28 2017 |
Externally published | Yes |
Funding
The authors would like to express their gratitude to the Department of Science and Technology (DOST) (107W) for funding the research and IBF Electronic GmbH & Co. KG for donating the equipment.
Keywords
- Microwave atmospheric plasma jet
- Photocatalytic property
- Plasma applications
- Thin films
- Zinc
- Zinc oxide