ZnO/Zn and ZnO film deposited via microwave atmospheric plasma jet as photo-catalyst for Rhodamine 6G dye degradation

Erin Joy C. Tinacba, Julius Andrew Nuñez, Roy B. Tumlos, Henry J. Ramos

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400 °C for 1 h leads to the oxidation of Zn forming ZnO film. The photo-catalytic properties of the ZnO/Zn and ZnO films for the degradation of Rhodamine 6G dye were then compared. ZnO/Zn film has higher degradation rate of 1.37%/min while ZnO film has 1.23%/min.

Original languageEnglish
Pages (from-to)197-200
Number of pages4
JournalThin Solid Films
Volume624
DOIs
StatePublished - Feb 28 2017
Externally publishedYes

Funding

The authors would like to express their gratitude to the Department of Science and Technology (DOST) (107W) for funding the research and IBF Electronic GmbH & Co. KG for donating the equipment.

Keywords

  • Microwave atmospheric plasma jet
  • Photocatalytic property
  • Plasma applications
  • Thin films
  • Zinc
  • Zinc oxide

Fingerprint

Dive into the research topics of 'ZnO/Zn and ZnO film deposited via microwave atmospheric plasma jet as photo-catalyst for Rhodamine 6G dye degradation'. Together they form a unique fingerprint.

Cite this