X‐ray photoelectron spectra of the U 4f levels in UF4, UF5 and UF6

L. D. Trowbridge, H. L. Richards

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

UF6, UF5 and UF4 have been studied by X‐ray photoelectron spectroscopy. U 4f7/2 binding energies for these compounds were observed to be 384.9, 383.4 and 382.3 eV, respectively. The corresponding U 4f5/2 energies were 395.7, 394.2 and 393.2 eV. Solid UF6 was formed by condensation of a molecular beam onto Ni and Cu substrates at −80° C. UF4 was produced by reaction of the UF6 beam at higher substrate temperatures (−30° C and 25 °C). UF5 was produced at higher temperature and pressure by reaction of Cu and UF6. In the X‐ray photoelectron spectroscopy vacuum chamber, the UF5 converted slowly to UF4, probably by disproportionation and loss of UF6.

Original languageEnglish
Pages (from-to)89-93
Number of pages5
JournalSurface and Interface Analysis
Volume4
Issue number3
DOIs
StatePublished - Jun 1982

Fingerprint

Dive into the research topics of 'X‐ray photoelectron spectra of the U 4f levels in UF4, UF5 and UF6'. Together they form a unique fingerprint.

Cite this