TY - JOUR
T1 - X‐ray photoelectron spectra of the U 4f levels in UF4, UF5 and UF6
AU - Trowbridge, L. D.
AU - Richards, H. L.
PY - 1982/6
Y1 - 1982/6
N2 - UF6, UF5 and UF4 have been studied by X‐ray photoelectron spectroscopy. U 4f7/2 binding energies for these compounds were observed to be 384.9, 383.4 and 382.3 eV, respectively. The corresponding U 4f5/2 energies were 395.7, 394.2 and 393.2 eV. Solid UF6 was formed by condensation of a molecular beam onto Ni and Cu substrates at −80° C. UF4 was produced by reaction of the UF6 beam at higher substrate temperatures (−30° C and 25 °C). UF5 was produced at higher temperature and pressure by reaction of Cu and UF6. In the X‐ray photoelectron spectroscopy vacuum chamber, the UF5 converted slowly to UF4, probably by disproportionation and loss of UF6.
AB - UF6, UF5 and UF4 have been studied by X‐ray photoelectron spectroscopy. U 4f7/2 binding energies for these compounds were observed to be 384.9, 383.4 and 382.3 eV, respectively. The corresponding U 4f5/2 energies were 395.7, 394.2 and 393.2 eV. Solid UF6 was formed by condensation of a molecular beam onto Ni and Cu substrates at −80° C. UF4 was produced by reaction of the UF6 beam at higher substrate temperatures (−30° C and 25 °C). UF5 was produced at higher temperature and pressure by reaction of Cu and UF6. In the X‐ray photoelectron spectroscopy vacuum chamber, the UF5 converted slowly to UF4, probably by disproportionation and loss of UF6.
UR - http://www.scopus.com/inward/record.url?scp=0020149257&partnerID=8YFLogxK
U2 - 10.1002/sia.740040303
DO - 10.1002/sia.740040303
M3 - Article
AN - SCOPUS:0020149257
SN - 0142-2421
VL - 4
SP - 89
EP - 93
JO - Surface and Interface Analysis
JF - Surface and Interface Analysis
IS - 3
ER -