Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

Alan G. Jacobs; Clemens Liedel; Christopher K. Ober; Michael O. Thompson

doi:10.1117/12.2086057

Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

Alan G. Jacobs, Clemens Liedel, Christopher K. Ober, Michael O. Thompson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

6 Scopus citations

Abstract

Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, f_PS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 10⁷ K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.

Original language	English
Title of host publication	Alternative Lithographic Technologies VII
Editors	Christopher Bencher, Douglas J. Resnick
Publisher	SPIE
ISBN (Electronic)	9781628415254
DOIs	https://doi.org/10.1117/12.2086057
State	Published - 2015
Externally published	Yes
Event	Alternative Lithographic Technologies VII - San Jose, United States Duration: Feb 23 2015 → Feb 26 2015

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	9423
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Alternative Lithographic Technologies VII
Country/Territory	United States
City	San Jose
Period	02/23/15 → 02/26/15

Keywords

GISAXS
Laser Spike Annealing
LSA
ODT
Order-Disorder Transition
Phase Segregation
PS-b-PMMA
μGISAXS

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10.1117/12.2086057

Cite this

Jacobs, A. G., Liedel, C., Ober, C. K., & Thompson, M. O. (2015). Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing. In C. Bencher, & D. J. Resnick (Eds.), Alternative Lithographic Technologies VII Article 942309 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9423). SPIE. https://doi.org/10.1117/12.2086057

@inproceedings{0e5c9698661041b2b8a962ddfede42c3,

title = "Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing",

abstract = "Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, fPS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 107 K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.",

keywords = "GISAXS, Laser Spike Annealing, LSA, ODT, Order-Disorder Transition, Phase Segregation, PS-b-PMMA, μGISAXS",

author = "Jacobs, \{Alan G.\} and Clemens Liedel and Ober, \{Christopher K.\} and Thompson, \{Michael O.\}",

note = "Publisher Copyright: {\textcopyright} 2015 SPIE.; Alternative Lithographic Technologies VII ; Conference date: 23-02-2015 Through 26-02-2015",

year = "2015",

doi = "10.1117/12.2086057",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Christopher Bencher and Resnick, \{Douglas J.\}",

booktitle = "Alternative Lithographic Technologies VII",

}

Jacobs, AG, Liedel, C, Ober, CK & Thompson, MO 2015, Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing. in C Bencher & DJ Resnick (eds), Alternative Lithographic Technologies VII., 942309, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9423, SPIE, Alternative Lithographic Technologies VII, San Jose, United States, 02/23/15. https://doi.org/10.1117/12.2086057

Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing. / Jacobs, Alan G.; Liedel, Clemens; Ober, Christopher K. et al.
Alternative Lithographic Technologies VII. ed. / Christopher Bencher; Douglas J. Resnick. SPIE, 2015. 942309 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9423).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

AU - Jacobs, Alan G.

AU - Liedel, Clemens

AU - Ober, Christopher K.

AU - Thompson, Michael O.

PY - 2015

Y1 - 2015

N2 - Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, fPS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 107 K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.

AB - Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, fPS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 107 K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.

KW - GISAXS

KW - Laser Spike Annealing

KW - LSA

KW - ODT

KW - Order-Disorder Transition

KW - Phase Segregation

KW - PS-b-PMMA

KW - μGISAXS

UR - https://www.scopus.com/pages/publications/84931366575

U2 - 10.1117/12.2086057

DO - 10.1117/12.2086057

M3 - Conference contribution

AN - SCOPUS:84931366575

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Alternative Lithographic Technologies VII

A2 - Bencher, Christopher

A2 - Resnick, Douglas J.

PB - SPIE

T2 - Alternative Lithographic Technologies VII

Y2 - 23 February 2015 through 26 February 2015

ER -

Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

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Keywords

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