Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University

Wen Bin Wu, Hai Tao Ren, Shi Xiang Peng, Yuan Xu, Jia Mei Wen, Jiang Sun, Ai Lin Zhang, Tao Zhang, Jing Feng Zhang, Jia Er Chen

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Optical emission spectroscopy (OES), as a simple in situ method without disturbing the plasma, has been performed for the plasma diagnosis of a 2.45 GHz permanent magnet electron cyclotron resonance (PMECR) ion source at Peking University (PKU). A spectrum measurement platform has been set up with the quartz-chamber electron cyclotron resonance (ECR) ion source [Patent Number: ZL 201110026605.4] and experiments were carried out recently. The electron temperature and electron density inside the ECR plasma chamber have been measured with the method of line intensity ratio of noble gas. Hydrogen plasma processes inside the discharge chamber are discussed based on the diagnostic results. What is more, the superiority of the method of line intensity ratio of noble gas is indicated with a comparison to line intensity ratio of hydrogen. Details will be presented in this paper.

Original languageEnglish
Article number095204
JournalChinese Physics B
Volume26
Issue number9
DOIs
StatePublished - Aug 2017
Externally publishedYes

Funding

∗Project supported by the National Natural Science Foundation of China (Grant Nos. 11175009 and 11575013). †Corresponding author. E-mail: [email protected]

FundersFunder number
National Natural Science Foundation of China11175009, 11575013
National Natural Science Foundation of China

    Keywords

    • electron cyclotron resonance (ECR) ion source
    • hydrogen plasma
    • optical emission spectroscopy
    • plasma diagnosis

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