Ultraviolet/ozone cleaning of carbon-contaminated optics

Roger W.C. Hansen; Mark Bissen; Dan Wallace; Jeff Wolske; Tom Miller

doi:10.1364/AO.32.004114

Ultraviolet/ozone cleaning of carbon-contaminated optics

Roger W.C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, Tom Miller

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

It is shown that ozone generated by U light can be used to clean carbon-contaminated synchrotronradiation optics.

Original language	English
Pages (from-to)	4114-4116
Number of pages	3
Journal	Applied Optics
Volume	32
Issue number	22
DOIs	https://doi.org/10.1364/AO.32.004114
State	Published - Aug 1993
Externally published	Yes

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title = "Ultraviolet/ozone cleaning of carbon-contaminated optics",

abstract = "It is shown that ozone generated by U light can be used to clean carbon-contaminated synchrotronradiation optics.",

author = "Hansen, {Roger W.C.} and Mark Bissen and Dan Wallace and Jeff Wolske and Tom Miller",

year = "1993",

month = aug,

doi = "10.1364/AO.32.004114",

language = "English",

volume = "32",

pages = "4114--4116",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "22",

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T1 - Ultraviolet/ozone cleaning of carbon-contaminated optics

AU - Hansen, Roger W.C.

AU - Bissen, Mark

AU - Wallace, Dan

AU - Wolske, Jeff

AU - Miller, Tom

PY - 1993/8

Y1 - 1993/8

N2 - It is shown that ozone generated by U light can be used to clean carbon-contaminated synchrotronradiation optics.

AB - It is shown that ozone generated by U light can be used to clean carbon-contaminated synchrotronradiation optics.

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DO - 10.1364/AO.32.004114

M3 - Article

AN - SCOPUS:0344715921

SN - 1559-128X

VL - 32

SP - 4114

EP - 4116

JO - Applied Optics

JF - Applied Optics

IS - 22

ER -

Ultraviolet/ozone cleaning of carbon-contaminated optics

Abstract

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