Ultrasensitive elemental analysis of solids by sputter initiated resonance ionization spectroscopy

J. E. Parks; H. W. Schmitt; G. S. Hurst

doi:10.1117/12.936233

Ultrasensitive elemental analysis of solids by sputter initiated resonance ionization spectroscopy

J. E. Parks, H. W. Schmitt, G. S. Hurst

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Abstract

This paper describes a new technique, Sputter-initiated Resonance Ionization Spectroscopy (SIRIS), for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 10l2 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

Original language	English
Pages (from-to)	32-39
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	426
DOIs	https://doi.org/10.1117/12.936233
State	Published - Oct 19 1983
Externally published	Yes

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10.1117/12.936233

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abstract = "This paper describes a new technique, Sputter-initiated Resonance Ionization Spectroscopy (SIRIS), for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 10l2 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.",

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AU - Hurst, G. S.

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N2 - This paper describes a new technique, Sputter-initiated Resonance Ionization Spectroscopy (SIRIS), for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 10l2 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

AB - This paper describes a new technique, Sputter-initiated Resonance Ionization Spectroscopy (SIRIS), for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 10l2 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Ultrasensitive elemental analysis of solids by sputter initiated resonance ionization spectroscopy

Abstract

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