Ultrasensitive elemental analysis of solids by sputter initiated resonance ionization spectroscopy

J. E. Parks, H. W. Schmitt, G. S. Hurst

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

This paper describes a new technique, Sputter-initiated Resonance Ionization Spectroscopy (SIRIS), for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 10l2 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.

Original languageEnglish
Pages (from-to)32-39
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume426
DOIs
StatePublished - Oct 19 1983
Externally publishedYes

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