Abstract
Laser spike annealing was applied to PS-b-PDMS diblock copolymers to induce short-time (millisecond time scale), high-temperature (300 to 700 °C) microphase segregation and directed self-assembly of sub-10 nm features. Conditions were identified that enabled uniform microphase separation in the time frame of tens of milliseconds. Microphase ordering improved with increased temperature and annealing time, whereas phase separation contrast was lost for very short annealing times at high temperature. PMMA brush underlayers aided ordering under otherwise identical laser annealing conditions. Good long-range order for sub-10 nm cylinder morphology was achieved using graphoepitaxy coupled with a 20 ms dwell laser spike anneal above 440 °C.
| Original language | English |
|---|---|
| Pages (from-to) | 31317-31324 |
| Number of pages | 8 |
| Journal | ACS Applied Materials and Interfaces |
| Volume | 9 |
| Issue number | 37 |
| DOIs | |
| State | Published - Sep 20 2017 |
| Externally published | Yes |
Funding
This work is based upon research conducted at the Cornell High Energy Synchrotron Source (CHESS) which is supported by the National Science Foundation and the National Institutes of Health/National Institute of General Medical Sciences under NSF award DMR-1332208, in the Cornell Center for Materials Research (NSF DMR-1120296), and in the Cornell Nanoscale Facility (NSF ECCS-1542081). A.G.J. acknowledges the Department of Defense (DoD) for financial support through the NDSEG fellowship program. C.L. acknowledges support by the Deutsche Forschungsgemeinschaft. We also thank our various collaborators, Michele Laus, Katia Sparnacci, Michele Perego, and Luca Boarino, for many helpful discussions on this topic.
Keywords
- block copolymers
- directed self-assembly
- graphoepitaxy
- laser annealing
- PS-b-PDMS