TY - JOUR
T1 - Tungsten oxide thin film exposed to low energy He plasma
T2 - Evidence for a thermal enhancement of the erosion yield
AU - Hijazi, H.
AU - Addab, Y.
AU - Maan, A.
AU - Duran, J.
AU - Donovan, D.
AU - Pardanaud, C.
AU - Ibrahim, M.
AU - Cabié, M.
AU - Roubin, P.
AU - Martin, C.
N1 - Publisher Copyright:
© 2016 Elsevier B.V.
PY - 2017/2/1
Y1 - 2017/2/1
N2 - Nanocrystalline tungsten oxide thin films (about 75 nm in thickness) produced by thermal oxidation of tungsten substrates were exposed to low energy He plasma (≈20 eV/He) with a flux of 2.5 × 1018 m−2 s−1 at two temperatures: room temperature and 673 K. The structure and morphology modifications which occur after this He bombardment and annealing treatments was studied using Raman spectroscopy and transmission electron microscopy. Due to the low fluence (4 × 1021 m−2) and low ion energy, we have observed only few morphology modifications after He plasma exposure at room temperature. On the contrary, at 673 K, a change in the layer color is observed associated to an important erosion. Detailed analyses before/after exposure and before/after annealing allow us to describe the He interaction with the oxide layer, its erosion and structural modification at the atomic and micrometer scale.
AB - Nanocrystalline tungsten oxide thin films (about 75 nm in thickness) produced by thermal oxidation of tungsten substrates were exposed to low energy He plasma (≈20 eV/He) with a flux of 2.5 × 1018 m−2 s−1 at two temperatures: room temperature and 673 K. The structure and morphology modifications which occur after this He bombardment and annealing treatments was studied using Raman spectroscopy and transmission electron microscopy. Due to the low fluence (4 × 1021 m−2) and low ion energy, we have observed only few morphology modifications after He plasma exposure at room temperature. On the contrary, at 673 K, a change in the layer color is observed associated to an important erosion. Detailed analyses before/after exposure and before/after annealing allow us to describe the He interaction with the oxide layer, its erosion and structural modification at the atomic and micrometer scale.
KW - Erosion
KW - He plasma bombardment
KW - Plasma wall interaction
KW - Raman spectroscopy
KW - Transmission electron microscopy
KW - Tungsten oxide thin film
UR - http://www.scopus.com/inward/record.url?scp=84999836269&partnerID=8YFLogxK
U2 - 10.1016/j.jnucmat.2016.11.030
DO - 10.1016/j.jnucmat.2016.11.030
M3 - Article
AN - SCOPUS:84999836269
SN - 0022-3115
VL - 484
SP - 91
EP - 97
JO - Journal of Nuclear Materials
JF - Journal of Nuclear Materials
ER -