TY - JOUR
T1 - Top-Down Fabrication of Atomic Patterns in Twisted Bilayer Graphene
AU - Dyck, Ondrej
AU - Yeom, Sinchul
AU - Lupini, Andrew R.
AU - Swett, Jacob L.
AU - Hensley, Dale
AU - Yoon, Mina
AU - Jesse, Stephen
N1 - Publisher Copyright:
© 2024 Wiley-VCH GmbH.
PY - 2024/1/18
Y1 - 2024/1/18
N2 - Adv. Mater. 2023, 35, 2302906 DOI: 10.1002/adma.202302906 In the Experimental Section under “Sample Preparation” the first line reads: “Low-pressure chemical vapor deposition (LP-CVD) was used to grow graphene on Cu foil.[28]” This is hereby corrected to: “Atmospheric-pressure chemical vapor deposition (AP-CVD) was used to grow graphene on Cu foil.[28]” In addition, the reference that appears at the end of the sentence currently points to ref. [28]. This is incorrect. The correct new reference is as follows: I. Vlassiouk, P. Fulvio, H. Meyer, N. Lavrik, S. Dai, P. Datskos, S. Smirnov, Carbon 2013, 54 (Supplement C), 58.
AB - Adv. Mater. 2023, 35, 2302906 DOI: 10.1002/adma.202302906 In the Experimental Section under “Sample Preparation” the first line reads: “Low-pressure chemical vapor deposition (LP-CVD) was used to grow graphene on Cu foil.[28]” This is hereby corrected to: “Atmospheric-pressure chemical vapor deposition (AP-CVD) was used to grow graphene on Cu foil.[28]” In addition, the reference that appears at the end of the sentence currently points to ref. [28]. This is incorrect. The correct new reference is as follows: I. Vlassiouk, P. Fulvio, H. Meyer, N. Lavrik, S. Dai, P. Datskos, S. Smirnov, Carbon 2013, 54 (Supplement C), 58.
UR - http://www.scopus.com/inward/record.url?scp=85179658883&partnerID=8YFLogxK
U2 - 10.1002/adma.202312065
DO - 10.1002/adma.202312065
M3 - Comment/debate
AN - SCOPUS:85179658883
SN - 0935-9648
VL - 36
JO - Advanced Materials
JF - Advanced Materials
IS - 3
M1 - 2312065
ER -