ToF-SIMS imaging study of the early stages of corrosion in Al-Cu thin films

A. Seyeux, G. S. Frankel, N. Missert, K. A. Unocic, L. H. Klein, A. Galtayries, P. Marcus

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

The pitting corrosion of Al-Cu thin film alloys was investigated using samples that were heat treated in air to form through-thickness Al2Cu particles within an Al-0.5 Cu matrix. Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) analysis revealed Cu-rich regions 250-800 nm in lateral extent near the metal/oxide interface. Following exposure that generated pitting corrosion, secondary electron, secondary ion, and AFM images showed pits with size and density similar to those of the Cu-rich regions. The role of the Cu-rich regions is addressed.

Original languageEnglish
Pages (from-to)C165-C171
JournalJournal of the Electrochemical Society
Volume158
Issue number6
DOIs
StatePublished - 2011

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