Thickness limitations in carbon nanotube reinforced silicon nitride coatings synthesized by vapor infiltration

Abhishek K. Kothari; Brian W. Sheldon; Gyula Eres

doi:10.1016/j.actamat.2012.09.017

Thickness limitations in carbon nanotube reinforced silicon nitride coatings synthesized by vapor infiltration

Abhishek K. Kothari, Brian W. Sheldon, Gyula Eres

Quantum Heterostructures

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7 Scopus citations

Abstract

Chemical vapor infiltration is a convenient method for synthesizing carbon nanotube (CNT)-reinforced ceramic coatings. The thickness over which infiltration is relatively uniform is limited by gas phase diffusion in the pore structure. These effects were investigated in two types of silicon nitride matrix composites. With CNTs that were distributed uniformly on the substrate surface dense coatings were limited to thicknesses of several microns. With dual structured CNT arrays produced by photolithography coatings up to 400 μm thick were obtained with minimal residual porosity. Gas transport into these dual structured materials was facilitated by creating micron sized channels between "CNT pillars" (i.e. each pillar consisted of a large number of individual CNTs). The experimental results are consistent with basic comparisons between the rates of gas diffusion and silicon nitride growth in porous structures. This analysis also provides a general insight into optimizing infiltration conditions during the fabrication of thick CNT-reinforced composite coatings.

Original language	English
Pages (from-to)	7104-7111
Number of pages	8
Journal	Acta Materialia
Volume	60
Issue number	20
DOIs	https://doi.org/10.1016/j.actamat.2012.09.017
State	Published - Dec 2012

Funding

The authors gratefully acknowledge support from the US Department of Energy, Office of Basic Energy Sciences under contract DE-FG02-10ER46771 with Brown University. A portion of this research was also conducted at the Center for Nanophase Materials Sciences, which is sponsored at Oak Ridge National Laboratory by the Scientific User Facilities Division, Office of Basic Energy Sciences, US Department of Energy.

Funders	Funder number
Scientific User Facilities Division
U.S. Department of Energy
Basic Energy Sciences	DE-FG02-10ER46771
Oak Ridge National Laboratory
Brown University

Keywords

Carbon nanotubes
Chemical vapor infiltration
Coatings
Multiwalled carbon nanotubes
Vapor infiltration

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10.1016/j.actamat.2012.09.017

Cite this

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abstract = "Chemical vapor infiltration is a convenient method for synthesizing carbon nanotube (CNT)-reinforced ceramic coatings. The thickness over which infiltration is relatively uniform is limited by gas phase diffusion in the pore structure. These effects were investigated in two types of silicon nitride matrix composites. With CNTs that were distributed uniformly on the substrate surface dense coatings were limited to thicknesses of several microns. With dual structured CNT arrays produced by photolithography coatings up to 400 μm thick were obtained with minimal residual porosity. Gas transport into these dual structured materials was facilitated by creating micron sized channels between {"}CNT pillars{"} (i.e. each pillar consisted of a large number of individual CNTs). The experimental results are consistent with basic comparisons between the rates of gas diffusion and silicon nitride growth in porous structures. This analysis also provides a general insight into optimizing infiltration conditions during the fabrication of thick CNT-reinforced composite coatings.",

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AB - Chemical vapor infiltration is a convenient method for synthesizing carbon nanotube (CNT)-reinforced ceramic coatings. The thickness over which infiltration is relatively uniform is limited by gas phase diffusion in the pore structure. These effects were investigated in two types of silicon nitride matrix composites. With CNTs that were distributed uniformly on the substrate surface dense coatings were limited to thicknesses of several microns. With dual structured CNT arrays produced by photolithography coatings up to 400 μm thick were obtained with minimal residual porosity. Gas transport into these dual structured materials was facilitated by creating micron sized channels between "CNT pillars" (i.e. each pillar consisted of a large number of individual CNTs). The experimental results are consistent with basic comparisons between the rates of gas diffusion and silicon nitride growth in porous structures. This analysis also provides a general insight into optimizing infiltration conditions during the fabrication of thick CNT-reinforced composite coatings.

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Thickness limitations in carbon nanotube reinforced silicon nitride coatings synthesized by vapor infiltration

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