Thermally stable novel metal contacts on bulk, single-Crystal n-type ZnO

J. S. Wright, R. Khanna, L. F. Voss, L. Stafford, B. P. Gila, D. P. Norton, S. J. Pearton, F. Ren, I. Kravchenko

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The contact characteristics on bulk single-crystal n-type ZnO of TiB 2/Pt/Au, ZrB2/Pt/Au and Ir/Au metallization schemes deposited by sputtering are reported as a function of annealing temperature in the range 200-1000°C (N2 ambient). Boride contacts exhibited Ohmic behavior with minimum specific contact resistance between 10-33 and 10 -5 Ωcm2 after a 700°C or above anneal. The contacts transition to rectifying behavior after annealing above 900°C, coincident with a degraded surface morphology. Ir contacts exhibit higher thermal stability than both Boride contacts investigated, exhibiting a minimum specific contact resistance of 3.6 × 10-6 Ωcm2 after annealing at 1000°C. Ir contacts showed very little change in resistance after extended aging (30 days) at 350°C.

Original languageEnglish
Title of host publicationECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface
PublisherElectrochemical Society Inc.
Pages279-284
Number of pages6
Edition2
ISBN (Electronic)9781566775519
ISBN (Print)9781566775519
DOIs
StatePublished - 2007
Event46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting - Chicago, IL, United States
Duration: May 6 2007May 10 2007

Publication series

NameECS Transactions
Number2
Volume6
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting
Country/TerritoryUnited States
CityChicago, IL
Period05/6/0705/10/07

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