Thermally stable boride Ohmic contacts on n-ZnO

J. S. Wright, R. Khanna, D. P. Norton, S. J. Pearton, F. Ren, I. Kravchenko

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The annealing temperature dependence of contact characteristics on bulk single-crystal n- ZnO using a TiB2/Pt/Au metallization scheme deposited by sputtering are reported. The contacts are rectifying for anneal temperatures < 700°C but transition to Ohmic behavior at higher temperatures and exhibit a minimum specific contact resistivity of 5×10-4 Ω. cm after 800°C anneals. Higher temperatures lead to severe contact metallurgy intermixing and a sharp increase in specific contact resistivity associated with an increase in sheet resistance of the ZnO under the contact. Pt, Ti, Zn and B outdiffuse through the Au layer at 800°C while at higher temperatures the contact morphology is destroyed. These boride-based contacts show much higher thermal stability than previous metal schemes used as Ohmic contacts on ZnO and are promising for high temperature device applications copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationState-of-the-Art Program on Compound Semiconductors XLIV
PublisherElectrochemical Society Inc.
Pages173-179
Number of pages7
Edition5
ISBN (Electronic)9781566774420
DOIs
StatePublished - 2006
Externally publishedYes
EventState-of-the-Art Program on Compound Semiconductors XLIV 209th Electrochemical Society Meeting - Denver, CO, United States
Duration: May 7 2006May 12 2006

Publication series

NameECS Transactions
Number5
Volume2
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceState-of-the-Art Program on Compound Semiconductors XLIV 209th Electrochemical Society Meeting
Country/TerritoryUnited States
CityDenver, CO
Period05/7/0605/12/06

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