Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity

C. E. Bouldin; W. E. Wallace; G. W. Lynn; S. C. Roth; W. L. Wu

doi:10.1063/1.373722

Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity

C. E. Bouldin, W. E. Wallace, G. W. Lynn, S. C. Roth, W. L. Wu

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the same sample as an external parameter is varied, and determines the change in film thickness. The analysis process is very accurate and depends on no assumed model. We determine a thermal expansion coefficient of 55±9 × 10^-6K^-1 using this approach.

Original language	English
Pages (from-to)	691-695
Number of pages	5
Journal	Journal of Applied Physics
Volume	88
Issue number	2
DOIs	https://doi.org/10.1063/1.373722
State	Published - Jul 15 2000
Externally published	Yes

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10.1063/1.373722

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title = "Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity",

abstract = "We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the same sample as an external parameter is varied, and determines the change in film thickness. The analysis process is very accurate and depends on no assumed model. We determine a thermal expansion coefficient of 55±9 × 10-6K-1 using this approach.",

author = "Bouldin, {C. E.} and Wallace, {W. E.} and Lynn, {G. W.} and Roth, {S. C.} and Wu, {W. L.}",

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AU - Bouldin, C. E.

AU - Wallace, W. E.

AU - Lynn, G. W.

AU - Roth, S. C.

AU - Wu, W. L.

PY - 2000/7/15

Y1 - 2000/7/15

N2 - We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the same sample as an external parameter is varied, and determines the change in film thickness. The analysis process is very accurate and depends on no assumed model. We determine a thermal expansion coefficient of 55±9 × 10-6K-1 using this approach.

AB - We determine the thermal expansion coefficient of a fluorinated poly(arylene ether) low-k dielectric film using Fourier analysis of x-ray reflectivity data. The approach is similar to that used in Fourier analysis of x-ray absorption fine structure. The analysis compares two similar samples, or the same sample as an external parameter is varied, and determines the change in film thickness. The analysis process is very accurate and depends on no assumed model. We determine a thermal expansion coefficient of 55±9 × 10-6K-1 using this approach.

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U2 - 10.1063/1.373722

DO - 10.1063/1.373722

M3 - Article

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SP - 691

EP - 695

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 2

ER -

Thermal expansion coefficients of low-k dielectric films from Fourier analysis of x-ray reflectivity

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