Abstract
We present measurements of the electron energy threshold, fluence, and temperature dependence for O2 production during low-energy (5-100 eV) electron bombardment of thin (∼ 40 bilayer) amorphous and crystalline D2O ice films deposited on a Pt(1 1 1) substrate in vacuum. The electron energy threshold (referenced to the vacuum level) for O2 formation is approximately 10 ± 2 eV. This threshold is due to valence level electronic excitations or ionization of condensed water molecules. Comparison of the fluence dependence with kinetic models shows that the formation of O2 is dominated by direct excitation and dissociation of a stable precursor molecule, and not by diffusion and recombination of oxygen atoms. The O2 yield is also strongly dependent upon the temperature of ice, is different for crystalline and amorphous ice films, and is indicative of surface and bulk structural transitions. We demonstrate that electron-stimulated production of O2 is important in radiation processing of low-temperature icy surfaces present on outer solar system bodies. This is particularly true in regions with strong magnetospheres such as the Saturnine and Jovian systems.
Original language | English |
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Pages (from-to) | 1-7 |
Number of pages | 7 |
Journal | Surface Science |
Volume | 528 |
Issue number | 1-3 |
DOIs | |
State | Published - Mar 20 2003 |
Event | DIET -9 - Aussois, France Duration: Jun 1 2002 → Jun 4 2002 |
Funding
We thank Dr. William C. Simpson for assistance in these studies. The equipment used in this work was developed with support from the United States Department of Energy (DOE); Office of Science, Chemical Physics Program and the work was supported by the DOE, Office of Science, Contract DE-FG02-02ER15337.
Keywords
- Amorphous surfaces
- Electron bombardment
- Oxygen
- Water