The first full-field EUV masks ready for printing

Uwe Mickan; Regier Groeneveld; Marcel Demarteau; Jan Hendrik Peters; Uwe Dersch; Günter Hess; Holger Seitz

doi:10.1117/12.692629

The first full-field EUV masks ready for printing

Uwe Mickan
, Regier Groeneveld
, Marcel Demarteau
, Jan Hendrik Peters
, Uwe Dersch
, Günter Hess
, Holger Seitz

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Original language	English
Title of host publication	EMLC 2006
Subtitle of host publication	22nd European Mask and Lithography Conference
DOIs	https://doi.org/10.1117/12.692629
State	Published - 2006
Externally published	Yes
Event	EMLC 2006: 22nd European Mask and Lithography Conference - Dresden, Germany Duration: Jan 23 2006 → Jan 26 2006

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6281
ISSN (Print)	0277-786X

Conference

Conference	EMLC 2006: 22nd European Mask and Lithography Conference
Country/Territory	Germany
City	Dresden
Period	01/23/06 → 01/26/06

Access to Document

10.1117/12.692629

Cite this

@inproceedings{76243983bb0c408ead1bac8f473b0b6c,

title = "The first full-field EUV masks ready for printing",

author = "Uwe Mickan and Regier Groeneveld and Marcel Demarteau and Peters, \{Jan Hendrik\} and Uwe Dersch and G{\"u}nter Hess and Holger Seitz",

year = "2006",

doi = "10.1117/12.692629",

language = "English",

isbn = "0819463566",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "EMLC 2006",

note = "EMLC 2006: 22nd European Mask and Lithography Conference ; Conference date: 23-01-2006 Through 26-01-2006",

}

Mickan, U, Groeneveld, R, Demarteau, M, Peters, JH, Dersch, U, Hess, G & Seitz, H 2006, The first full-field EUV masks ready for printing. in EMLC 2006: 22nd European Mask and Lithography Conference., 628105, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6281, EMLC 2006: 22nd European Mask and Lithography Conference, Dresden, Germany, 01/23/06. https://doi.org/10.1117/12.692629

The first full-field EUV masks ready for printing. / Mickan, Uwe; Groeneveld, Regier; Demarteau, Marcel et al.
EMLC 2006: 22nd European Mask and Lithography Conference. 2006. 628105 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6281).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - The first full-field EUV masks ready for printing

AU - Mickan, Uwe

AU - Groeneveld, Regier

AU - Demarteau, Marcel

AU - Peters, Jan Hendrik

AU - Dersch, Uwe

AU - Hess, Günter

AU - Seitz, Holger

PY - 2006

Y1 - 2006

UR - https://www.scopus.com/pages/publications/33748038461

U2 - 10.1117/12.692629

DO - 10.1117/12.692629

M3 - Conference contribution

AN - SCOPUS:33748038461

SN - 0819463566

SN - 9780819463562

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - EMLC 2006

T2 - EMLC 2006: 22nd European Mask and Lithography Conference

Y2 - 23 January 2006 through 26 January 2006

ER -

The first full-field EUV masks ready for printing

Publication series

Conference

Access to Document

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Cite this