Skip to main navigation Skip to search Skip to main content

The effects of proton irradiation on the reliability of InAlN/GaN high electron mobility transistors

  • L. Liu
  • , C. F. Lo
  • , Y. Y. Xi
  • , Y. X. Wang
  • , H. Y. Kim
  • , J. Kim
  • , S. J. Pearton
  • , O. Laboutin
  • , Y. Cao
  • , J. W. Johnson
  • , I. I. Kravchenko
  • , F. Ren

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We have investigated the effect of proton irradiation on reliability of InAlN/GaN high electron mobility transistors (HEMTs). Devices were subjected to 5-15 MeV proton irradiations with a fixed dose of 5 × 1015 cm-2, or to a different doses of 2 × 1011, 5 × 1013 or 2 × 1015 cm-2 of protons at a fixed energy of 5 MeV. During off-state electrical stressing, the typical critical voltage for un-irradiated devices was 45 to 55 V. By sharp contrast, no critical voltage was detected for proton irradiated HEMTs up to 100 V, which was instrument-limited. After electrical stressing, no degradation was observed for the drain or gate current-voltage characteristics of the proton-irradiated HEMTs. However, the drain current decreased ∼12%, and the reverse bias gate leakage current increased more than two orders of magnitude for unirradiated HEMTs as a result of electrical stressing.

Original languageEnglish
Title of host publicationGallium Nitride Materials and Devices VIII
DOIs
StatePublished - 2013
Externally publishedYes
EventSPIE Symposium on Gallium Nitride Materials and Devices VIII - San Francisco, CA, United States
Duration: Feb 4 2013Feb 7 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8625
ISSN (Print)0277-786X

Conference

ConferenceSPIE Symposium on Gallium Nitride Materials and Devices VIII
Country/TerritoryUnited States
CitySan Francisco, CA
Period02/4/1302/7/13

Fingerprint

Dive into the research topics of 'The effects of proton irradiation on the reliability of InAlN/GaN high electron mobility transistors'. Together they form a unique fingerprint.

Cite this