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The effects of layering in ferroelectric Si-doped HfO
2
thin films
Patrick D. Lomenzo
, Qanit Takmeel
, Chuanzhen Zhou
, Yang Liu
,
Chris M. Fancher
, Jacob L. Jones
, Saeed Moghaddam
, Toshikazu Nishida
Research output
:
Contribution to journal
›
Article
›
peer-review
61
Scopus citations
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2
thin films'. Together they form a unique fingerprint.
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Material Science
Doping (Additives)
100%
Ferroelectric Material
100%
Thin Films
100%
Capacitor
20%
Engineering
Thin Films
100%
Dopants
75%
Dopant Concentration
50%
Hysteresis Loop
25%
Mols
25%
Atomic Layer
25%