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The effects of layering in ferroelectric Si-doped HfO2 thin films
Patrick D. Lomenzo, Qanit Takmeel, Chuanzhen Zhou, Yang Liu, Chris M. Fancher, Jacob L. Jones, Saeed Moghaddam, Toshikazu Nishida
Research output: Contribution to journal › Article › peer-review
59
Scopus
citations