The contribution of valence unstable ytterbium states into kinetic properties of YbNi2-xGe2+x and YbCu2-xSi2+x

B. C. Kuzhel, I. D. Shcherba, I. I. Kravchenko

Research output: Contribution to journalArticlepeer-review

Abstract

The intermetalic YbNi2-xGe2+x (-0.25 ≥ x ≥ 0.25) and YbCu2-xSi2+x (-0.20 ≥ x ≥ 0.20) alloy systems (CeGa2Al2 -type crystal structure) were studied by measuring X-ray absorption and diffraction at room temperatures as well as electrical resistivity and thermopower in the 4.2-300 K temperature range. The temperature dependence of the contribution of valence unstable Yb ions to the total electrical resistance has been analyzed. The qualitative estimation of this contribution has been performed by utilizing the following equation:Δ ρYb (T) = ρexp (T) - ρYbC u2 G e2 (T) - Δ ρ4.2 K,where Δ ρYbC u2 G e2 (T) is the temperature dependence of YbCu2Ge2 electrical resistance, Δρ4.2 = ρ4.2(exp) - ρ4.2(YbCu2Ge2).

Original languageEnglish
Pages (from-to)54-58
Number of pages5
JournalJournal of Alloys and Compounds
Volume425
Issue number1-2
DOIs
StatePublished - Nov 30 2006
Externally publishedYes

Keywords

  • Electronic transport
  • Intermetallic
  • Kondo effects
  • X-ray diffraction
  • X-ray spectroscopies

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