Temperature-enhanced electron attachment to CH3Cl

P. G. Datskos; L. G. Christophorou; J. G. Carter

doi:10.1016/0009-2614(90)85619-N

Temperature-enhanced electron attachment to CH₃Cl

P. G. Datskos, L. G. Christophorou, J. G. Carter

Sensors and Electronics

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Abstract

The weak dissociative electron attachment to CH₃Cl below ≈ 1 eV is very strongly dependent on the gas temperature; the rate constant for the process increases by 3 to 4 orders of magnitude when the temperature is increased from 300 to 750 K.

Original language	English
Pages (from-to)	324-329
Number of pages	6
Journal	Chemical Physics Letters
Volume	168
Issue number	3-4
DOIs	https://doi.org/10.1016/0009-2614(90)85619-N
State	Published - May 4 1990

Funding

* Research sponsored by the Office of Health and Environment Research, US Department of Energy under contract No. DE-AC05-840R2 1400 with Martin Marietta Energy Systems, Inc.

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10.1016/0009-2614(90)85619-N

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@article{e95cd8dd8fd84e29b3015ad841e939c7,

title = "Temperature-enhanced electron attachment to CH3Cl",

abstract = "The weak dissociative electron attachment to CH3Cl below ≈ 1 eV is very strongly dependent on the gas temperature; the rate constant for the process increases by 3 to 4 orders of magnitude when the temperature is increased from 300 to 750 K.",

author = "Datskos, \{P. G.\} and Christophorou, \{L. G.\} and Carter, \{J. G.\}",

year = "1990",

month = may,

day = "4",

doi = "10.1016/0009-2614(90)85619-N",

language = "English",

volume = "168",

pages = "324--329",

journal = "Chemical Physics Letters",

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number = "3-4",

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TY - JOUR

T1 - Temperature-enhanced electron attachment to CH3Cl

AU - Datskos, P. G.

AU - Christophorou, L. G.

AU - Carter, J. G.

PY - 1990/5/4

Y1 - 1990/5/4

N2 - The weak dissociative electron attachment to CH3Cl below ≈ 1 eV is very strongly dependent on the gas temperature; the rate constant for the process increases by 3 to 4 orders of magnitude when the temperature is increased from 300 to 750 K.

AB - The weak dissociative electron attachment to CH3Cl below ≈ 1 eV is very strongly dependent on the gas temperature; the rate constant for the process increases by 3 to 4 orders of magnitude when the temperature is increased from 300 to 750 K.

UR - https://www.scopus.com/pages/publications/0009177656

U2 - 10.1016/0009-2614(90)85619-N

DO - 10.1016/0009-2614(90)85619-N

M3 - Article

AN - SCOPUS:0009177656

SN - 0009-2614

VL - 168

SP - 324

EP - 329

JO - Chemical Physics Letters

JF - Chemical Physics Letters

IS - 3-4

ER -

Temperature-enhanced electron attachment to CH₃Cl

Abstract

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