Abstract
A technique was proposed for the production of metal hydride films with known amounts of hydrogen isotopes. Metal occluder film of a particular thickness was deposited and loaded with a known gas composition. The volumes of various parts of the loading system were determined using physical vapor transport measurements. The technique was found to be suitable for the growth of metal hydride films with different hydrogen isotope ratios with an uncertainty of 2%.
| Original language | English |
|---|---|
| Pages (from-to) | 2706-2708 |
| Number of pages | 3 |
| Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
| Volume | 19 |
| Issue number | 5 |
| DOIs | |
| State | Published - 2001 |
| Externally published | Yes |
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