Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration

Jong Hun Kim, Kyung Hwan Jin, Yeonjoon Jung, Gwan Hyoung Lee, Jaeyoon Baik, Daehyun Kim, Moon Ho Jo, Arthur P. Baddorf, An Ping Li, Jewook Park

Research output: Contribution to journalArticlepeer-review

Abstract

We manipulated the stacking configuration of a few-layer MoS2 to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS2 islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides.

Original languageEnglish
JournalACS Applied Nano Materials
DOIs
StateAccepted/In press - 2024

Keywords

  • density functional theory
  • electrical bandgap
  • Interlayer coupling
  • Kelvin probe microscopy
  • local density of states
  • scanning tunneling microscopy and spectroscopy
  • transition metal dichalcogenides

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