System considerations for maskless lithography

T. Karnowski; D. Joy; L. Allard; L. Clonts

doi:10.1117/12.530899

System considerations for maskless lithography

T. Karnowski, D. Joy, L. Allard, L. Clonts

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

The use of maskless lithography processes for printing structures on integrated circuits (IC) is discussed. A maskless printing system was modeled from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a maskless lithography system. The best printable image were determined for a variety of redundant scanning array concept (RSA) geometries, which resulted in the printer element spacing. The results indicate that the printing quality is the key element for the determination of the necessary data rates to support competitive manufacturing with masskless lithography devices.

Original language	English
Pages (from-to)	1080-1091
Number of pages	12
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5374
Issue number	PART 2
DOIs	https://doi.org/10.1117/12.530899
State	Published - 2004
Event	Emerging Lithographic Technologies VIII - Santa Clara, CA, United States Duration: Feb 24 2004 → Feb 26 2004

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1117/12.530899

Cite this

@article{32b56033c9e64cd2a901ec8550b46a00,

title = "System considerations for maskless lithography",

abstract = "The use of maskless lithography processes for printing structures on integrated circuits (IC) is discussed. A maskless printing system was modeled from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a maskless lithography system. The best printable image were determined for a variety of redundant scanning array concept (RSA) geometries, which resulted in the printer element spacing. The results indicate that the printing quality is the key element for the determination of the necessary data rates to support competitive manufacturing with masskless lithography devices.",

author = "T. Karnowski and D. Joy and L. Allard and L. Clonts",

year = "2004",

doi = "10.1117/12.530899",

language = "English",

volume = "5374",

pages = "1080--1091",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "Society of Photo-Optical Instrumentation Engineers",

number = "PART 2",

note = "Emerging Lithographic Technologies VIII ; Conference date: 24-02-2004 Through 26-02-2004",

}

TY - JOUR

T1 - System considerations for maskless lithography

AU - Karnowski, T.

AU - Joy, D.

AU - Allard, L.

AU - Clonts, L.

PY - 2004

Y1 - 2004

N2 - The use of maskless lithography processes for printing structures on integrated circuits (IC) is discussed. A maskless printing system was modeled from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a maskless lithography system. The best printable image were determined for a variety of redundant scanning array concept (RSA) geometries, which resulted in the printer element spacing. The results indicate that the printing quality is the key element for the determination of the necessary data rates to support competitive manufacturing with masskless lithography devices.

AB - The use of maskless lithography processes for printing structures on integrated circuits (IC) is discussed. A maskless printing system was modeled from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a maskless lithography system. The best printable image were determined for a variety of redundant scanning array concept (RSA) geometries, which resulted in the printer element spacing. The results indicate that the printing quality is the key element for the determination of the necessary data rates to support competitive manufacturing with masskless lithography devices.

UR - http://www.scopus.com/inward/record.url?scp=3843084985&partnerID=8YFLogxK

U2 - 10.1117/12.530899

DO - 10.1117/12.530899

M3 - Conference article

AN - SCOPUS:3843084985

SN - 0277-786X

VL - 5374

SP - 1080

EP - 1091

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

IS - PART 2

T2 - Emerging Lithographic Technologies VIII

Y2 - 24 February 2004 through 26 February 2004

ER -

System considerations for maskless lithography

Abstract

UN SDGs

Access to Document

Other files and links

Fingerprint

Cite this