Synthesis of metal chloride films: Influence of growth conditions on crystallinity

Rebecca D. McAuliffe; Guang Yang; Jagjit Nanda; Gabriel M. Veith

doi:10.1016/j.tsf.2019.137520

Synthesis of metal chloride films: Influence of growth conditions on crystallinity

Rebecca D. McAuliffe, Guang Yang, Jagjit Nanda, Gabriel M. Veith

Energy Storage & Conversion

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

This paper presents the first deposition of metal chlorides by RF magnetron sputtering. By integrating the sputter chamber with an Ar-filled glovebox, films of hygroscopic chlorides can be synthesized and studied. The structure, composition, and morphology of FeCl₃ and FeCl₂ films were investigated as a function of deposition rate. In FeCl₃ films, the deposition rate has a large impact on the crystallinity of as-deposited films regardless of the substrate used. At high deposition rates, 24 Å/s, FeCl₃ films are crystalline with a preferred orientation along the 003-plane, while at low deposition rates, 0.5 Å/s, no crystalline peaks are observed for FeCl₃. In FeCl₂, the highest deposition rate achieved in this study was 0.2 Å/s which yields films with no crystalline peaks; therefore, Raman spectroscopy was used to confirm the presence of FeCl₂. The deposition of iron chlorides by RF magnetron sputtering opens the way for the study of thin film metal halides to understand their growth, magnetic and electronic properties, and understand ion transport through their layered structures.

Original language	English
Article number	137520
Journal	Thin Solid Films
Volume	689
DOIs	https://doi.org/10.1016/j.tsf.2019.137520
State	Published - Nov 1 2019

Funding

This work was supported as part of GENESIS: A Next Generation Synthesis Center, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award Number DE-SC0019212 . Research was performed at Oak Ridge National Laboratory (ORNL), managed by UT Battelle, LLC for the U.S. Department of Energy (DOE) under contract DE-AC05-00OR22725. Raman Spectroscopy work was supported by Assistant Secretary, Energy Efficiency and Renewable Energy, Department of Energy through Vehicle Technology Office. GY thanks postdoc educational investment program at Oak Ridge National Laboratory.

Funders	Funder number
U.S. Department of Energy
Battelle	DE-AC05-00OR22725
Office of Science
Office of Energy Efficiency and Renewable Energy
Basic Energy Sciences	DE-SC0019212
Oak Ridge National Laboratory

Keywords

Deposition rate
Iron chloride
Metal chloride
RF magnetron sputtering

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title = "Synthesis of metal chloride films: Influence of growth conditions on crystallinity",

abstract = "This paper presents the first deposition of metal chlorides by RF magnetron sputtering. By integrating the sputter chamber with an Ar-filled glovebox, films of hygroscopic chlorides can be synthesized and studied. The structure, composition, and morphology of FeCl3 and FeCl2 films were investigated as a function of deposition rate. In FeCl3 films, the deposition rate has a large impact on the crystallinity of as-deposited films regardless of the substrate used. At high deposition rates, 24 {\AA}/s, FeCl3 films are crystalline with a preferred orientation along the 003-plane, while at low deposition rates, 0.5 {\AA}/s, no crystalline peaks are observed for FeCl3. In FeCl2, the highest deposition rate achieved in this study was 0.2 {\AA}/s which yields films with no crystalline peaks; therefore, Raman spectroscopy was used to confirm the presence of FeCl2. The deposition of iron chlorides by RF magnetron sputtering opens the way for the study of thin film metal halides to understand their growth, magnetic and electronic properties, and understand ion transport through their layered structures.",

keywords = "Deposition rate, Iron chloride, Metal chloride, RF magnetron sputtering",

author = "McAuliffe, {Rebecca D.} and Guang Yang and Jagjit Nanda and Veith, {Gabriel M.}",

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AU - McAuliffe, Rebecca D.

AU - Yang, Guang

AU - Nanda, Jagjit

AU - Veith, Gabriel M.

PY - 2019/11/1

Y1 - 2019/11/1

N2 - This paper presents the first deposition of metal chlorides by RF magnetron sputtering. By integrating the sputter chamber with an Ar-filled glovebox, films of hygroscopic chlorides can be synthesized and studied. The structure, composition, and morphology of FeCl3 and FeCl2 films were investigated as a function of deposition rate. In FeCl3 films, the deposition rate has a large impact on the crystallinity of as-deposited films regardless of the substrate used. At high deposition rates, 24 Å/s, FeCl3 films are crystalline with a preferred orientation along the 003-plane, while at low deposition rates, 0.5 Å/s, no crystalline peaks are observed for FeCl3. In FeCl2, the highest deposition rate achieved in this study was 0.2 Å/s which yields films with no crystalline peaks; therefore, Raman spectroscopy was used to confirm the presence of FeCl2. The deposition of iron chlorides by RF magnetron sputtering opens the way for the study of thin film metal halides to understand their growth, magnetic and electronic properties, and understand ion transport through their layered structures.

AB - This paper presents the first deposition of metal chlorides by RF magnetron sputtering. By integrating the sputter chamber with an Ar-filled glovebox, films of hygroscopic chlorides can be synthesized and studied. The structure, composition, and morphology of FeCl3 and FeCl2 films were investigated as a function of deposition rate. In FeCl3 films, the deposition rate has a large impact on the crystallinity of as-deposited films regardless of the substrate used. At high deposition rates, 24 Å/s, FeCl3 films are crystalline with a preferred orientation along the 003-plane, while at low deposition rates, 0.5 Å/s, no crystalline peaks are observed for FeCl3. In FeCl2, the highest deposition rate achieved in this study was 0.2 Å/s which yields films with no crystalline peaks; therefore, Raman spectroscopy was used to confirm the presence of FeCl2. The deposition of iron chlorides by RF magnetron sputtering opens the way for the study of thin film metal halides to understand their growth, magnetic and electronic properties, and understand ion transport through their layered structures.

KW - Deposition rate

KW - Iron chloride

KW - Metal chloride

KW - RF magnetron sputtering

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Synthesis of metal chloride films: Influence of growth conditions on crystallinity

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