Abstract
In photonics, the field concentration and enhancement have been major objectives for achieving size reduction and device integration. Plasmonics offers resonant field confinement and enhancement, but ultra-sharp optical resonances in all-dielectric multi-layer thin films are emerging as a powerful contestant. Thus, applications capitalizing upon stronger and sharper optical resonances and larger field enhancements could be faced with a choice for the superior platform. Here, we present a comparison between plasmonic and dielectric multi-layer thin films for their resonance merits. We show that the remarkable characteristics of the resonance behavior of optimized dielectric multi-layers can outweigh those of their metallic counterpart.
Original language | English |
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Article number | 011107 |
Journal | Applied Physics Letters |
Volume | 111 |
Issue number | 1 |
DOIs | |
State | Published - Jul 3 2017 |
Externally published | Yes |
Funding
A.L.L., M.Z., and C.A. would like to acknowledge the CNRS, the Aix-Marseille Université, and the région PACA for financial supports. A.P. acknowledges support from the laboratory directed research and development funds at the Oak Ridge National Laboratory. This manuscript has been authored by UT-Battelle, LLC under Contract No. DE-AC05-00OR22725 with the U.S. Department of Energy. The publisher, by accepting the article for publication, acknowledges that the U.S. Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this manuscript or allow others to do so, for U.S. Government purposes. The Department of Energy will provide public access to these results of federally sponsored research in accordance with the DOE Public Access Plan (http://energy.gov/downloads/doe-public-access-plan).
Funders | Funder number |
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Aix-Marseille Université | |
C.A. | |
LLC | |
UT-Battelle | |
Research and Development | |
Oak Ridge National Laboratory | |
Centre National de la Recherche Scientifique |