Surface morphology and electronic state characterization of Ni-P amorphous alloy films

Hexing Li, Weijiang Wang, Haiying Chen, Jing Fa Deng

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

Thin films of Ni-P amorphous alloy were deposited by electroless plating onto a p-type silicon substrate. The films underwent a cyclic oxidation-reduction or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC), extended X-ray absorption fine structure (EXAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning tunneling microscopy (STM). The change in the surface composition and surface electronic state were investigated by X-ray photoelectron spectroscopy (XPS).

Original languageEnglish
Pages (from-to)31-38
Number of pages8
JournalJournal of Non-Crystalline Solids
Volume281
Issue number1-3
DOIs
StatePublished - Mar 2001
Externally publishedYes

Funding

This work was supported by the National Natural Science Foundation of China. We are also grateful to the Committee of Shanghai Education for providing financial support for this study.

FundersFunder number
Committee of Shanghai Education
National Natural Science Foundation of China

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