Abstract
Thin films of Ni-P amorphous alloy were deposited by electroless plating onto a p-type silicon substrate. The films underwent a cyclic oxidation-reduction or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC), extended X-ray absorption fine structure (EXAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning tunneling microscopy (STM). The change in the surface composition and surface electronic state were investigated by X-ray photoelectron spectroscopy (XPS).
Original language | English |
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Pages (from-to) | 31-38 |
Number of pages | 8 |
Journal | Journal of Non-Crystalline Solids |
Volume | 281 |
Issue number | 1-3 |
DOIs | |
State | Published - Mar 2001 |
Externally published | Yes |
Funding
This work was supported by the National Natural Science Foundation of China. We are also grateful to the Committee of Shanghai Education for providing financial support for this study.
Funders | Funder number |
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Committee of Shanghai Education | |
National Natural Science Foundation of China |