Abstract
Thin films of Ni-P amorphous alloy were deposited by electroless plating onto a p-type silicon substrate. The films underwent a cyclic oxidation-reduction or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC), extended X-ray absorption fine structure (EXAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning tunneling microscopy (STM). The change in the surface composition and surface electronic state were investigated by X-ray photoelectron spectroscopy (XPS).
| Original language | English |
|---|---|
| Pages (from-to) | 31-38 |
| Number of pages | 8 |
| Journal | Journal of Non-Crystalline Solids |
| Volume | 281 |
| Issue number | 1-3 |
| DOIs | |
| State | Published - Mar 2001 |
| Externally published | Yes |
Funding
This work was supported by the National Natural Science Foundation of China. We are also grateful to the Committee of Shanghai Education for providing financial support for this study.