Surface modification of Au/TiO2 catalysts by SiO2 via atomic layer deposition

Zhen Ma; Suree Brown; Jane Y. Howe; Steven H. Overbury; Sheng Dai

doi:10.1021/jp801484h

Surface modification of Au/TiO₂ catalysts by SiO₂ via atomic layer deposition

Zhen Ma, Suree Brown, Jane Y. Howe, Steven H. Overbury, Sheng Dai

Research output: Contribution to journal › Article › peer-review

121 Scopus citations

Abstract

Atomic layer deposition (ALD) was utilized for the surface engineering of metallic nanoparticles to tame their sintering problems and catalytic activities. We chose the surface modification of gold nanocatalysts as an example to demonstrate the concept of this ALD-based approach. Herein, an active Au/TiO₂ catalyst was modified by amorphous SiO₂ via ALD, and the samples were characterized by inductively coupled plasma-optical emission spectrometry (ICP-OES), scanning (SEM-EDX) and transmission electron microscope-energy-dispersive X-ray spectrometry (TEM-EDX), X-ray diffraction (XRD), and thermogravimetry/differential thermogravimetry (TG/DTG), and the catalytic activities in CO oxidation and H₂ oxidation were tested with respect to the pretreatment temperature and SiO₂ content. A significant sintering resistance and changes in catalytic activities were observed. The difference between the SiO₂/Au/TiO₂ samples prepared by gas-phase ALD and solution-phase chemical grafting was discussed.

Original language	English
Pages (from-to)	9448-9457
Number of pages	10
Journal	Journal of Physical Chemistry C
Volume	112
Issue number	25
DOIs	https://doi.org/10.1021/jp801484h
State	Published - Jun 26 2008

Access to Document

10.1021/jp801484h

Cite this

@article{389a541e8dfc46618a62453e9d944d8a,

title = "Surface modification of Au/TiO2 catalysts by SiO2 via atomic layer deposition",

abstract = "Atomic layer deposition (ALD) was utilized for the surface engineering of metallic nanoparticles to tame their sintering problems and catalytic activities. We chose the surface modification of gold nanocatalysts as an example to demonstrate the concept of this ALD-based approach. Herein, an active Au/TiO2 catalyst was modified by amorphous SiO2 via ALD, and the samples were characterized by inductively coupled plasma-optical emission spectrometry (ICP-OES), scanning (SEM-EDX) and transmission electron microscope-energy-dispersive X-ray spectrometry (TEM-EDX), X-ray diffraction (XRD), and thermogravimetry/differential thermogravimetry (TG/DTG), and the catalytic activities in CO oxidation and H2 oxidation were tested with respect to the pretreatment temperature and SiO2 content. A significant sintering resistance and changes in catalytic activities were observed. The difference between the SiO2/Au/TiO2 samples prepared by gas-phase ALD and solution-phase chemical grafting was discussed.",

author = "Zhen Ma and Suree Brown and Howe, {Jane Y.} and Overbury, {Steven H.} and Sheng Dai",

year = "2008",

month = jun,

day = "26",

doi = "10.1021/jp801484h",

language = "English",

volume = "112",

pages = "9448--9457",

journal = "Journal of Physical Chemistry C",

issn = "1932-7447",

publisher = "American Chemical Society",

number = "25",

}

TY - JOUR

T1 - Surface modification of Au/TiO2 catalysts by SiO2 via atomic layer deposition

AU - Ma, Zhen

AU - Brown, Suree

AU - Howe, Jane Y.

AU - Overbury, Steven H.

AU - Dai, Sheng

PY - 2008/6/26

Y1 - 2008/6/26

N2 - Atomic layer deposition (ALD) was utilized for the surface engineering of metallic nanoparticles to tame their sintering problems and catalytic activities. We chose the surface modification of gold nanocatalysts as an example to demonstrate the concept of this ALD-based approach. Herein, an active Au/TiO2 catalyst was modified by amorphous SiO2 via ALD, and the samples were characterized by inductively coupled plasma-optical emission spectrometry (ICP-OES), scanning (SEM-EDX) and transmission electron microscope-energy-dispersive X-ray spectrometry (TEM-EDX), X-ray diffraction (XRD), and thermogravimetry/differential thermogravimetry (TG/DTG), and the catalytic activities in CO oxidation and H2 oxidation were tested with respect to the pretreatment temperature and SiO2 content. A significant sintering resistance and changes in catalytic activities were observed. The difference between the SiO2/Au/TiO2 samples prepared by gas-phase ALD and solution-phase chemical grafting was discussed.

AB - Atomic layer deposition (ALD) was utilized for the surface engineering of metallic nanoparticles to tame their sintering problems and catalytic activities. We chose the surface modification of gold nanocatalysts as an example to demonstrate the concept of this ALD-based approach. Herein, an active Au/TiO2 catalyst was modified by amorphous SiO2 via ALD, and the samples were characterized by inductively coupled plasma-optical emission spectrometry (ICP-OES), scanning (SEM-EDX) and transmission electron microscope-energy-dispersive X-ray spectrometry (TEM-EDX), X-ray diffraction (XRD), and thermogravimetry/differential thermogravimetry (TG/DTG), and the catalytic activities in CO oxidation and H2 oxidation were tested with respect to the pretreatment temperature and SiO2 content. A significant sintering resistance and changes in catalytic activities were observed. The difference between the SiO2/Au/TiO2 samples prepared by gas-phase ALD and solution-phase chemical grafting was discussed.

UR - http://www.scopus.com/inward/record.url?scp=53549097644&partnerID=8YFLogxK

U2 - 10.1021/jp801484h

DO - 10.1021/jp801484h

M3 - Article

AN - SCOPUS:53549097644

SN - 1932-7447

VL - 112

SP - 9448

EP - 9457

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 25

ER -

Surface modification of Au/TiO₂ catalysts by SiO₂ via atomic layer deposition

Abstract

Access to Document

Other files and links

Fingerprint

Cite this