Surface biasing influence on the physical sputtering in fusion devices

Jet Contributors; I. Borodkina; D. Borodin; S. Brezinsek; I. V. Tsvetkov; V. A. Kurnaev; C. C. Klepper; A. Lasa; A. Kreter

doi:10.1088/1742-6596/748/1/012002

Surface biasing influence on the physical sputtering in fusion devices

Jet Contributors, I. Borodkina, D. Borodin, S. Brezinsek, I. V. Tsvetkov, V. A. Kurnaev, C. C. Klepper, A. Lasa, A. Kreter

Diagnostics and Control

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

A new simplified analytical expression for the electromagnetic field in the Debye sheath in the presence of an oblique magnetic field including surface biasing effect is suggested. It is in good agreement with the numerical solution of the integral equation for the potential distribution in the Debye sheath. The energy and angular impact distributions and corresponding surface sputtering yields were analyzed in the presence of an oblique magnetic field and surface biasing. The analytical expression was used to estimate a) the effective sputtering yield of the W target with a varying negative voltage against plasma in PSI-2 linear device and b) erosion of the JET outer wall Be limiter near the ICRH antenna enhanced during RF emission.

Original language	English
Article number	012002
Journal	Journal of Physics: Conference Series
Volume	748
Issue number	1
DOIs	https://doi.org/10.1088/1742-6596/748/1/012002
State	Published - Sep 23 2016
Event	19th Conference on Plasma Surface Interactions, PSI 2016 - Moscow, Russian Federation Duration: Jan 28 2016 → Jan 29 2016

Funding

Funders	Funder number
Horizon 2020 Framework Programme	633053

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1088/1742-6596/748/1/012002

Cite this

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title = "Surface biasing influence on the physical sputtering in fusion devices",

abstract = "A new simplified analytical expression for the electromagnetic field in the Debye sheath in the presence of an oblique magnetic field including surface biasing effect is suggested. It is in good agreement with the numerical solution of the integral equation for the potential distribution in the Debye sheath. The energy and angular impact distributions and corresponding surface sputtering yields were analyzed in the presence of an oblique magnetic field and surface biasing. The analytical expression was used to estimate a) the effective sputtering yield of the W target with a varying negative voltage against plasma in PSI-2 linear device and b) erosion of the JET outer wall Be limiter near the ICRH antenna enhanced during RF emission.",

author = "Jet Contributors and I. Borodkina and D. Borodin and S. Brezinsek and Tsvetkov, {I. V.} and Kurnaev, {V. A.} and Klepper, {C. C.} and A. Lasa and A. Kreter",

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T1 - Surface biasing influence on the physical sputtering in fusion devices

AU - Contributors, Jet

AU - Borodkina, I.

AU - Borodin, D.

AU - Brezinsek, S.

AU - Tsvetkov, I. V.

AU - Kurnaev, V. A.

AU - Klepper, C. C.

AU - Lasa, A.

AU - Kreter, A.

PY - 2016/9/23

Y1 - 2016/9/23

N2 - A new simplified analytical expression for the electromagnetic field in the Debye sheath in the presence of an oblique magnetic field including surface biasing effect is suggested. It is in good agreement with the numerical solution of the integral equation for the potential distribution in the Debye sheath. The energy and angular impact distributions and corresponding surface sputtering yields were analyzed in the presence of an oblique magnetic field and surface biasing. The analytical expression was used to estimate a) the effective sputtering yield of the W target with a varying negative voltage against plasma in PSI-2 linear device and b) erosion of the JET outer wall Be limiter near the ICRH antenna enhanced during RF emission.

AB - A new simplified analytical expression for the electromagnetic field in the Debye sheath in the presence of an oblique magnetic field including surface biasing effect is suggested. It is in good agreement with the numerical solution of the integral equation for the potential distribution in the Debye sheath. The energy and angular impact distributions and corresponding surface sputtering yields were analyzed in the presence of an oblique magnetic field and surface biasing. The analytical expression was used to estimate a) the effective sputtering yield of the W target with a varying negative voltage against plasma in PSI-2 linear device and b) erosion of the JET outer wall Be limiter near the ICRH antenna enhanced during RF emission.

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DO - 10.1088/1742-6596/748/1/012002

M3 - Conference article

AN - SCOPUS:84991672213

SN - 1742-6588

VL - 748

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

IS - 1

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T2 - 19th Conference on Plasma Surface Interactions, PSI 2016

Y2 - 28 January 2016 through 29 January 2016

ER -

Surface biasing influence on the physical sputtering in fusion devices

Abstract

Funding

UN SDGs

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