Study of the effects of GaN buffer layer quality on the dc characteristics of AlGaN/GaN high electron mobility transistors

Shihyun Ahn, Weidi Zhu, Chen Dong, Lingcong Le, Ya Hsi Hwang, Byung Jae Kim, Fan Ren, Stephen J. Pearton, Aaron G. Lind, Kevin S. Jones, I. I. Kravchenko, Ming Lan Zhang

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Abstract

The effect of buffer layer quality on dc characteristics of AlGaN/GaN high electron mobility (HEMTs) was studied. AlGaN/GaN HEMT structures with 2 and 5 μm GaN buffer layers on sapphire substrates from two different vendors with the same Al concentration of AlGaN were used. The defect densities of HEMT structures with 2 and 5 μm GaN buffer layer were 7 × 109 and 5 × 108cm-2, respectively, as measured by transmission electron microscopy. There was little difference in drain saturation current or in transfer characteristics in HEMTs on these two types of buffer. However, there was no dispersion observed on the nonpassivated HEMTs with 5 μm GaN buffer layer for gate-lag pulsed measurement at 100 kHz, which was in sharp contrast to the 71% drain current reduction for the HEMT with 2 μm GaN buffer layer.

Original languageEnglish
Article number031210
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume33
Issue number3
DOIs
StatePublished - May 1 2015

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