Abstract
Nitrogen-doped graphene (N-graphene) has been intensively studied for tailoring the electronic property of the graphene, because different nitrogen configurations influence the electronic properties of N-graphene in different ways. However, atomically precise control of the nitrogen configurations during the doping process remains a challenge in the synthesis of N-graphene. Moreover, additional structural transformations of the graphene carbon network structure as a side-effect of plasma doping are little understood and are as of yet uncontrollable. Therefore, we theoretically investigated the nitrogen doping process of graphene for a range of nitrogen atom incident kinetic energies in nonequilibrium quantum chemical molecular dynamics (QM/MD) simulations. We observed and characterized prominent configurations of N-containing graphene. In analogy to similar, earlier studies of graphene plasma hydrogenation, we observed an Eley-Rideal associative desorption mechanism during the graphene plasma nitrogenation, producing molecular nitrogen. Especially for graphitic-N (Gr-N) and Stone-Wales-defect-N (SW-N) configurations, which are frequently observed in experimental studies, we discovered two typical chemical reaction mechanisms which were well categorized by two key processes: adsorption of primary nitrogen dopant and collision with a secondary nitrogen dopant. We discussed effects of the incident nitrogen energy on the formation mechanism, and propose a method to generate of Gr-N and SW-N configurations selectively by tuning the conditions with respect to the two key formation processes.
Original language | English |
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Pages (from-to) | 12112-12120 |
Number of pages | 9 |
Journal | Physical Chemistry Chemical Physics |
Volume | 21 |
Issue number | 23 |
DOIs | |
State | Published - 2019 |
Funding
The authors thank to the CAMPUS Asia Support for the Formation of a Core Center (Re-inventing Japan Project Type A) by the Japan Society for the Promotion of Science (JSPS). S. I. was partially supported by the Laboratory Directed Research and Development (LDRD) Program of Oak Ridge National Laboratory. ORNL is managed by UT-Battelle, LLC, for DOE under contract DE-AC05-00OR22725. We also thank Dr. Ashi Savara at ORNL for his helpful comments on the manuscript and Professor Masamichi Yoshimura at the Toyota Technological Institute for valuable discussions.
Funders | Funder number |
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U.S. Department of Energy | DE-AC05-00OR22725 |
Oak Ridge National Laboratory | |
Laboratory Directed Research and Development | |
Japan Society for the Promotion of Science |