Structural properties of Bi2Te3 and Bi 2Se3 topological insulators grown by molecular beam epitaxy on GaAs(001) substrates

X. Liu, D. J. Smith, J. Fan, Y. H. Zhang, H. Cao, Y. P. Chen, J. Leiner, B. J. Kirby, M. Dobrowolska, J. K. Furdyna

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Abstract

Thin films of Bi2Te3 and Bi2Se3 have been grown on deoxidized GaAs(001) substrates using molecular beam epitaxy. Cross-sectional transmission electron microscopy established the highly parallel nature of the Te(Se)-Bi-Te(Se)-Bi-Te(Se) quintuple layers deposited on the slightly wavy GaAs substrate surface and the different crystal symmetries of the two materials. Raman mapping confirmed the presence of the strong characteristic peaks reported previously for these materials in bulk form. The overall quality of these films reveals the potential of combining topological insulators with ferromagnetic semiconductors for future applications.

Original languageEnglish
Article number171903
JournalApplied Physics Letters
Volume99
Issue number17
DOIs
StatePublished - Oct 24 2011
Externally publishedYes

Funding

This work was supported by NSF Grant DMR10-05851 for ND; for ASU an NSF grant, contract number 1002114 and an AFOSR Grant number FA9550-10-1-0129; Y.P.C. acknowledges support from DARPA MESO program. The authors acknowledge use of facilities in the John M. Cowley Center for High Resolution Electron Microscopy at Arizona State University and the x-ray reflectometer at the NIST Center for Neutron Research.

FundersFunder number
National Science FoundationDMR10-05851, 1002114
Air Force Office of Scientific ResearchFA9550-10-1-0129
Defense Advanced Research Projects Agency

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