Abstract
Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.
Original language | English |
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Article number | 173106 |
Pages (from-to) | 1-3 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 17 |
DOIs | |
State | Published - Oct 24 2005 |
Funding
One of the authors (Y.K.Y.) acknowledges support from the Michigan Tech Research Excellence Fund, the Department of the Army (Grant No. W911NF-04-1-0029, through the City College of New York), and the Center for Nanophase Materials Sciences sponsored by the Division of Materials Sciences and Engineering, U.S. Department of Energy, under Contract No. DE-AC05-00OR22725 with UT-Battelle, LLC.