Structural anisotropy in Sb thin films

Pradip Adhikari, Anuradha Wijesinghe, Anjali Rathore, Timothy Jinsoo Yoo, Gyehyeon Kim, Sinchul Yeom, Hyoung Taek Lee, Alessandro R. Mazza, Changhee Sohn, Hyeong Ryeol Park, Mina Yoon, Matthew Brahlek, Honggyu Kim, Joon Sue Lee

Research output: Contribution to journalArticlepeer-review

Abstract

Sb thin films have attracted wide interest due to their tunable band structure, topological phases, high electron mobility, and thermoelectric properties. We successfully grow epitaxial Sb thin films on a closely lattice-matched GaSb(001) surface by molecular beam epitaxy. We find a novel anisotropic directional dependence on their structural, morphological, and electronic properties. The origin of the anisotropic features is elucidated using first-principles density functional theory (DFT) calculations. The growth regime of crystalline and amorphous Sb thin films was determined by mapping the surface reconstruction phase diagram of the GaSb(001) surface under Sb2 flux, with confirmation of structural characterizations. Crystalline Sb thin films show a rhombohedral crystal structure along the rhombohedral (211) surface orientation parallel to the cubic (001) surface orientation of the GaSb substrate. At this coherent interface, Sb atoms are aligned with the GaSb lattice along the [ 1 ̄ 10 ] crystallographic direction but are not aligned well along the [110] crystallographic direction, which results in anisotropic features in reflection of high-energy electron diffraction patterns, misfit dislocation formation, surface morphology, and transport properties. Our DFT calculations show that the preferential orientation of the rhombohedral Sb (211) plane may originate from the GaSb surface, where Sb atoms align with the Ga and Sb atoms on the reconstructed surface. The formation energy calculations confirm the stability of the experimentally observed structures. Our results provide optimal film growth conditions for further studies of novel properties of Bi1−xSbx thin films with similar lattice parameters and an identical crystal structure, as well as functional heterostructures of them with III-V semiconductor layers along the (001) surface orientation, supported by a theoretical understanding of the anisotropic film orientation.

Original languageEnglish
Article number011116
JournalAPL Materials
Volume12
Issue number1
DOIs
StatePublished - Jan 1 2024

Funding

This work was supported by the Science Alliance at the University of Tennessee, Knoxville, through the Support for Affiliated Research Teams program, by the High-Potential Individuals Global Training Program (Task No. 2021-0-01580) through the Institute of Information and Communications Technology Planning & Evaluation (IITP) funded by the Republic of Korea Ministry of Science and ICT (MSIT) and by the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES), Materials Sciences and Engineering Division (MSED) (S.Y., M.B., and A.R.M.) and by the U.S. Department of Energy (DOE), Office of Science, National Quantum Information Science Research Centers, Quantum Science Center (M.Y.). This research used resources of the Oak Ridge Leadership Computing Facility (OLCF) and the Compute and Data Environment for Science (CADES) at the Oak Ridge National Laboratory, which are supported by the Office of Science of the U.S. Department of Energy under Contract No. DE-AC05-00OR22725 and of the National Energy Research Scientific Computing Center (NERSC), a U.S. Department of Energy Office of Science User Facility located at Lawrence Berkeley National Laboratory, operated under Contract No. DE-AC02-05CH11231 using NERSC Award No. BES-ERCAP0024568.

FundersFunder number
Compute and Data Environment for ScienceDE-AC05-00OR22725
Institute of Information and Communications Technology Planning & Evaluation
National Quantum Information Science Research Centers
Quantum Science Center
U.S. Department of Energy
Office of Science
Basic Energy Sciences
Lawrence Berkeley National LaboratoryDE-AC02-05CH11231, BES-ERCAP0024568
University of Tennessee2021-0-01580
Division of Materials Sciences and Engineering
Ministry of Science, ICT and Future Planning
Institute for Information and Communications Technology Promotion

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