Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge

L. G. Jacobsohn; D. F. Franceschini; I. V. Afanasyev-Charkin; D. W. Cooke; L. L. Daemen; R. D. Averitt; M. Nastasi

doi:10.1016/j.surfcoat.2005.09.015

Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge

L. G. Jacobsohn, D. F. Franceschini, I. V. Afanasyev-Charkin, D. W. Cooke, L. L. Daemen, R. D. Averitt, M. Nastasi

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The effects on fluorine incorporation on the structure and optical properties of amorphous hydrogenated silicon carbide films deposited by pulsed glow discharge were investigated. Fluorine is incorporated at the expense of silicon, and films with up to 16 at.% of fluorine were obtained as determined by ion beam analysis. Structural investigation was carried by Raman and infrared spectroscopies. Infrared results showed that incorporation of fluorine occurs in the form of Si-F bonds, and Raman results showed a progressive formation of graphitic agglomerates due to fluorine incorporation in the films. Because of the relatively high bonding energy of Si-F, preferential bonding of fluorine with silicon induces small changes in the optical gap.

Original language	English
Pages (from-to)	6079-6082
Number of pages	4
Journal	Surface and Coatings Technology
Volume	200
Issue number	20-21
DOIs	https://doi.org/10.1016/j.surfcoat.2005.09.015
State	Published - May 22 2006
Externally published	Yes

Funding

The authors are thankful to the Ion Beam Materials Laboratory staff for their support during the IBA measurements and to B. L. Bennett for the optical measurements. This work was supported by the DOE, Office of Basic Energy Sciences.

Funders	Funder number
U.S. Department of Energy
Basic Energy Sciences

Keywords

Fluorine
Glow discharge
Optical properties
Silicon carbide

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10.1016/j.surfcoat.2005.09.015

Cite this

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title = "Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge",

abstract = "The effects on fluorine incorporation on the structure and optical properties of amorphous hydrogenated silicon carbide films deposited by pulsed glow discharge were investigated. Fluorine is incorporated at the expense of silicon, and films with up to 16 at.% of fluorine were obtained as determined by ion beam analysis. Structural investigation was carried by Raman and infrared spectroscopies. Infrared results showed that incorporation of fluorine occurs in the form of Si-F bonds, and Raman results showed a progressive formation of graphitic agglomerates due to fluorine incorporation in the films. Because of the relatively high bonding energy of Si-F, preferential bonding of fluorine with silicon induces small changes in the optical gap.",

keywords = "Fluorine, Glow discharge, Optical properties, Silicon carbide",

author = "Jacobsohn, {L. G.} and Franceschini, {D. F.} and Afanasyev-Charkin, {I. V.} and Cooke, {D. W.} and Daemen, {L. L.} and Averitt, {R. D.} and M. Nastasi",

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doi = "10.1016/j.surfcoat.2005.09.015",

language = "English",

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pages = "6079--6082",

journal = "Surface and Coatings Technology",

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TY - JOUR

T1 - Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge

AU - Jacobsohn, L. G.

AU - Franceschini, D. F.

AU - Afanasyev-Charkin, I. V.

AU - Cooke, D. W.

AU - Daemen, L. L.

AU - Averitt, R. D.

AU - Nastasi, M.

PY - 2006/5/22

Y1 - 2006/5/22

N2 - The effects on fluorine incorporation on the structure and optical properties of amorphous hydrogenated silicon carbide films deposited by pulsed glow discharge were investigated. Fluorine is incorporated at the expense of silicon, and films with up to 16 at.% of fluorine were obtained as determined by ion beam analysis. Structural investigation was carried by Raman and infrared spectroscopies. Infrared results showed that incorporation of fluorine occurs in the form of Si-F bonds, and Raman results showed a progressive formation of graphitic agglomerates due to fluorine incorporation in the films. Because of the relatively high bonding energy of Si-F, preferential bonding of fluorine with silicon induces small changes in the optical gap.

AB - The effects on fluorine incorporation on the structure and optical properties of amorphous hydrogenated silicon carbide films deposited by pulsed glow discharge were investigated. Fluorine is incorporated at the expense of silicon, and films with up to 16 at.% of fluorine were obtained as determined by ion beam analysis. Structural investigation was carried by Raman and infrared spectroscopies. Infrared results showed that incorporation of fluorine occurs in the form of Si-F bonds, and Raman results showed a progressive formation of graphitic agglomerates due to fluorine incorporation in the films. Because of the relatively high bonding energy of Si-F, preferential bonding of fluorine with silicon induces small changes in the optical gap.

KW - Fluorine

KW - Glow discharge

KW - Optical properties

KW - Silicon carbide

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DO - 10.1016/j.surfcoat.2005.09.015

M3 - Article

AN - SCOPUS:33645836545

SN - 0257-8972

VL - 200

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EP - 6082

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 20-21

ER -

Structural and optical characterization of fluorinated hydrogenated silicon carbide films deposited by pulsed glow discharge

Abstract

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Keywords

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