Abstract
Metamaterial absorbers with nearly 100% absorption in the terahertz (THz) spectral band have been designed and fabricated using a periodic array of aluminum (Al) squares and an Al ground plane separated by a thin silicon dioxide (SiO 2) dielectric film. The entire structure is less than 1.6 mm thick making it suitable for the fabrication of microbolometers or bi-material sensors for THz imaging. Films with different dielectric layer thicknesses exhibited resonant absorption at 4.1, 4.2, and 4.5 THz with strengths of 98%, 95%, and 88%, respectively. The measured absorption spectra are in good agreement with simulations using finite element modeling.
Original language | English |
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Article number | 111104 |
Journal | Applied Physics Letters |
Volume | 100 |
Issue number | 11 |
DOIs | |
State | Published - Mar 12 2012 |
Funding
The work is supported in part by grants from the ONR, AFOSR, and NRO. The authors would like to thank George Jaksha and Sam Barone for technical assistance. This research was in part conducted at the Center for Nanophase Materials Sciences, which is sponsored at Oak Ridge National Laboratory by the Office of Basic Energy Sciences, U.S. Department of Energy.
Funders | Funder number |
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Office of Basic Energy Sciences | |
Office of Naval Research | |
U.S. Department of Energy | |
Air Force Office of Scientific Research | |
Oak Ridge National Laboratory | |
Nationaal Regieorgaan Onderwijsonderzoek |