Strain-Free, Ultra-High Purity Znse Layers Grown by Molecular Beam Epitaxy

R. M. Park, C. M. Rouleau, M. B. Troffer, T. Koyama, T. Yodo

Research output: Contribution to journalArticlepeer-review

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Abstract

ZnSe layers have been grown by molecular beam epitaxy on high-purity, high-quality ZnSe wafers [(100) oriented] cut from ingots grown by the iodine vapor transport method. Photoluminescence (PL) analysis indicates the homoepitaxial ZnSe material to be of ultra-high purity as well as being strain-free relative to ZnSe/(100) GaAs layers which exhibit in-plane biaxial tension. The 10 K PL spectra recorded from homoepitaxial layers exhibit unsplit free- and donor-bound exciton transitions of comparable intensity together with a strong peak at 2.7768 eV believed to be the so-called Iv transition in relaxed ZnSe. The ultra-high purity nature of the homoepitaxial layers is attributed to the high purity of the substrate material in addition to the use of high purity Zn and Se source materials in this work.

Original languageEnglish
Pages (from-to)475-477
Number of pages3
JournalJournal of Materials Research
Volume5
Issue number3
DOIs
StatePublished - Mar 1990
Externally publishedYes

Funding

The authors wish to thank Dr. John Potts of 3MSt. Paul for performing the PL measurements and for valuable discussions. Research at the University of Florida was supported in part by the State of Florida under the Microfabritech Program and by the Defense Advanced Research Projects Agency and the National

FundersFunder number
State of Florida
Defense Advanced Research Projects Agency

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