Step engineering for nucleation and domain orientation control in WSe2 epitaxy on c-plane sapphire

Haoyue Zhu, Nadire Nayir, Tanushree H. Choudhury, Anushka Bansal, Benjamin Huet, Kunyan Zhang, Alexander A. Puretzky, Saiphaneendra Bachu, Krystal York, Thomas V. Mc Knight, Nicholas Trainor, Aaryan Oberoi, Ke Wang, Saptarshi Das, Robert A. Makin, Steven M. Durbin, Shengxi Huang, Nasim Alem, Vincent H. Crespi, Adri C.T. van DuinJoan M. Redwing

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

Epitaxial growth of two-dimensional transition metal dichalcogenides on sapphire has emerged as a promising route to wafer-scale single-crystal films. Steps on the sapphire act as sites for transition metal dichalcogenide nucleation and can impart a preferred domain orientation, resulting in a substantial reduction in mirror twins. Here we demonstrate control of both the nucleation site and unidirectional growth direction of WSe2 on c-plane sapphire by metal–organic chemical vapour deposition. The unidirectional orientation is found to be intimately tied to growth conditions via changes in the sapphire surface chemistry that control the step edge location of WSe2 nucleation, imparting either a 0° or 60° orientation relative to the underlying sapphire lattice. The results provide insight into the role of surface chemistry on transition metal dichalcogenide nucleation and domain alignment and demonstrate the ability to engineer domain orientation over wafer-scale substrates.

Original languageEnglish
Pages (from-to)1295-1302
Number of pages8
JournalNature Nanotechnology
Volume18
Issue number11
DOIs
StatePublished - Nov 2023

Funding

The work was financially supported by the National Science Foundation (NSF) through the Pennsylvania State University 2D Crystal Consortium–Materials Innovation Platform (2DCC-MIP) under NSF cooperative agreement numbers DMR-1539916 and DMR-2039351. S.B. and N.A. acknowledge support provided by NSF Career grant number DMR-1654107. T.V.M. and J.M.R. acknowledge support from the Defense Technical Information Center under award number FA9550-21-1-0460. N.T. acknowledges support from the NSF Graduate Research Fellowship Program under grant number DGE1255832. K.Z. and S.H. acknowledge support from NSF under grant numbers ECCS-1943895 and ECCS-2246564 and Air Force Office of Scientific Research under grant number FA9550-22-1-0408. SHG measurements were supported by the Center for Nanophase Materials Sciences (CNMS), which is a US Department of Energy Office of Science User Facility at Oak Ridge National Laboratory.

FundersFunder number
Center for Nanophase Materials Sciences
National Science Foundation
Air Force Office of Scientific ResearchFA9550-22-1-0408
Office of Science
Oak Ridge National Laboratory
Pennsylvania State UniversityDMR-1654107, DMR-1539916, DMR-2039351
Defense Technical Information CenterDGE1255832, FA9550-21-1-0460, ECCS-1943895, ECCS-2246564

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