Sputter-initiated resonance ionization spectroscopy

J. E. Parks; H. W. Schmitt; G. S. Hurst; W. M. Fairbank

doi:10.1016/0040-6090(83)90042-1

Sputter-initiated resonance ionization spectroscopy

J. E. Parks, H. W. Schmitt, G. S. Hurst, W. M. Fairbank

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Abstract

A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitives down to 1 part in 10¹² should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented.

Original language	English
Pages (from-to)	69-78
Number of pages	10
Journal	Thin Solid Films
Volume	108
Issue number	1
DOIs	https://doi.org/10.1016/0040-6090(83)90042-1
State	Published - Oct 7 1983
Externally published	Yes

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10.1016/0040-6090(83)90042-1

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title = "Sputter-initiated resonance ionization spectroscopy",

abstract = "A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitives down to 1 part in 1012 should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented.",

author = "Parks, {J. E.} and Schmitt, {H. W.} and Hurst, {G. S.} and Fairbank, {W. M.}",

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AU - Parks, J. E.

AU - Schmitt, H. W.

AU - Hurst, G. S.

AU - Fairbank, W. M.

PY - 1983/10/7

Y1 - 1983/10/7

N2 - A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitives down to 1 part in 1012 should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented.

AB - A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitives down to 1 part in 1012 should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented.

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DO - 10.1016/0040-6090(83)90042-1

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VL - 108

SP - 69

EP - 78

JO - Thin Solid Films

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Sputter-initiated resonance ionization spectroscopy

Abstract

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