TY - JOUR
T1 - Site-Selective Atomic Layer Deposition on Rutile TiO2
T2 - Selective Hydration as a Route to Target Point Defects
AU - Kamphaus, Ethan P.
AU - Jones, Jessica Catharine
AU - Shan, Nannan
AU - Martinson, Alex B.F.
AU - Cheng, Lei
N1 - Publisher Copyright:
© 2023 UChicago Argonne, LLC, Operator of Argonne National Laboratory. Published by American Chemical Society.
PY - 2023/1/26
Y1 - 2023/1/26
N2 - Routes to area- and especially site-selective atomic layer deposition (ALD) remain an enticing challenge in precision surface science, despite the potentially game-changing capability for many energy applications. An unparalleled level of surface reaction control is required to direct ALD to select sites on the same nominal material, for example, targeted growth on distinct phases, facets, step-edges, and/or defects. However, as a sequential surface synthesis method, ALD is uniquely suited to these challenges, including the possibility of selective deposition at defective surface atom arrangements. We computationally identify conditions for site-selective ALD through hydration of surface defects, including oxygen vacancies and titanium interstitials on low-index rutile TiO2 facets. First-principles computation is used to predict, as a function of temperature, the hydroxylation of defects that are targeted by proton-exchange-mediated ALD processes. In situ ellipsometric measurements of ALD Al2O3 nucleation on TiO2 (110) single crystals prepared with and without abundant oxygen vacancies demonstrate striking contrast, corroborating computational predictions and revealing a mechanistically clear path to site-selective ALD.
AB - Routes to area- and especially site-selective atomic layer deposition (ALD) remain an enticing challenge in precision surface science, despite the potentially game-changing capability for many energy applications. An unparalleled level of surface reaction control is required to direct ALD to select sites on the same nominal material, for example, targeted growth on distinct phases, facets, step-edges, and/or defects. However, as a sequential surface synthesis method, ALD is uniquely suited to these challenges, including the possibility of selective deposition at defective surface atom arrangements. We computationally identify conditions for site-selective ALD through hydration of surface defects, including oxygen vacancies and titanium interstitials on low-index rutile TiO2 facets. First-principles computation is used to predict, as a function of temperature, the hydroxylation of defects that are targeted by proton-exchange-mediated ALD processes. In situ ellipsometric measurements of ALD Al2O3 nucleation on TiO2 (110) single crystals prepared with and without abundant oxygen vacancies demonstrate striking contrast, corroborating computational predictions and revealing a mechanistically clear path to site-selective ALD.
UR - http://www.scopus.com/inward/record.url?scp=85146340670&partnerID=8YFLogxK
U2 - 10.1021/acs.jpcc.2c06992
DO - 10.1021/acs.jpcc.2c06992
M3 - Article
AN - SCOPUS:85146340670
SN - 1932-7447
VL - 127
SP - 1397
EP - 1406
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
IS - 3
ER -