Abstract
We show that aberration-corrected scanning transmission electron microscopy operating at low accelerating voltages is able to analyze, simultaneously and with single atom resolution and sensitivity, the local atomic configuration, chemical identities, and optical response at point defect sites in monolayer graphene. Sequential fast-scan annular dark-field (ADF) imaging provides direct visualization of point defect diffusion within the graphene lattice, with all atoms clearly resolved and identified via quantitative image analysis. Summing multiple ADF frames of stationary defects produce images with minimized statistical noise and reduced distortions of atomic positions. Electron energy-loss spectrum imaging of single atoms allows the delocalization of inelastic scattering to be quantified, and full quantum mechanical calculations are able to describe the delocalization effect with good accuracy. These capabilities open new opportunities to probe the defect structure, defect dynamics, and local optical properties in 2D materials with single atom sensitivity.
Original language | English |
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Pages (from-to) | 1342-1354 |
Number of pages | 13 |
Journal | Microscopy and Microanalysis |
Volume | 18 |
Issue number | 6 |
DOIs | |
State | Published - Dec 2012 |
Keywords
- ADF imaging
- EELS
- STEM
- aberration corrected
- defect
- delocalization
- grapheme
- optical response
- plasmons
- single atom
- spectrum imaging