Simulation of strain induced interface migration in symmetric tilt grain boundaries

S. Namilae, B. Radhakrishnan, G. B. Sarma

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Grain boundary migration of flat symmetric tilt grain boundaries is simulated using molecular dynamics. The driving force for migration is achieved by applying uniaxial strain on one of the grains in the bicrystal, enabling the growth of strain free grain at the expense of strained grain. Arrhenius dependence of grain boundary mobility on temperature and a linear relation between mobility and grain boundary velocity are observed. Simulations suggest that the mechanism of migration is dependent on vacancy diffusion combined with local reshuffling of atoms near the grain boundary.

Original languageEnglish
Title of host publicationGeneral Abstracts
Subtitle of host publicationStructural Materials Division 2007 - Proceedings of Symposium held during the 2007 TMS Annual Meeting
Pages55-68
Number of pages14
StatePublished - 2007
Event136th TMS Annual Meeting, 2007 - Orlando, FL, United States
Duration: Feb 25 2007Mar 1 2007

Publication series

NameTMS Annual Meeting

Conference

Conference136th TMS Annual Meeting, 2007
Country/TerritoryUnited States
CityOrlando, FL
Period02/25/0703/1/07

Keywords

  • Grain boundary
  • Migration
  • Molecular dynamics

Fingerprint

Dive into the research topics of 'Simulation of strain induced interface migration in symmetric tilt grain boundaries'. Together they form a unique fingerprint.

Cite this