Silicon carbide/diamond heterostructure rectifying contacts

T. P. Humphreys, J. D. Hunn, B. K. Patnaik, N. R. Parikh, D. M. Malta, K. Das

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

The first results pertaining to the fabrication of an optically transparent SiC contact on naturally occurring semiconducting diamond C(001) substrates are reported. The SiC layer is formed by electron-beam evaporation of an Si film followed by a two-step high-temperature annealing process. By employing Al dots as a metal mask, mesa heterostructure diodes comprising Al/SiC/C(001) were fabricated by etching in an electron cyclotron resonance oxygen plasma. Rectifying I-V characteristics were obtained from the mesa heterostructures.

Original languageEnglish
Pages (from-to)1332-1334
Number of pages3
JournalElectronics Letters
Volume29
Issue number15
DOIs
StatePublished - Jul 1993
Externally publishedYes

Keywords

  • Rectification
  • Semiconductor junctions

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