Abstract
The first results pertaining to the fabrication of an optically transparent SiC contact on naturally occurring semiconducting diamond C(001) substrates are reported. The SiC layer is formed by electron-beam evaporation of an Si film followed by a two-step high-temperature annealing process. By employing Al dots as a metal mask, mesa heterostructure diodes comprising Al/SiC/C(001) were fabricated by etching in an electron cyclotron resonance oxygen plasma. Rectifying I-V characteristics were obtained from the mesa heterostructures.
Original language | English |
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Pages (from-to) | 1332-1334 |
Number of pages | 3 |
Journal | Electronics Letters |
Volume | 29 |
Issue number | 15 |
DOIs | |
State | Published - Jul 1993 |
Externally published | Yes |
Keywords
- Rectification
- Semiconductor junctions