Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering

N. A. Richter; B. Yang; J. P. Barnard; T. Niu; X. Sheng; D. Shaw; M. Watanabe; G. Rane; U. Krause; P. Dürrenfeld; H. Wang; X. Zhang

doi:10.1016/j.apsusc.2023.157709

Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering

N. A. Richter, B. Yang, J. P. Barnard, T. Niu, X. Sheng, D. Shaw, M. Watanabe, G. Rane, U. Krause, P. Dürrenfeld, H. Wang, X. Zhang

Alloy Behavior & Design

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

Titanium nitride (TiN) coatings fabricated through reactive sputtering feature a suite of parameters capable of altering the microstructure and properties. Here, we explore the influence of bipolar pulsed direct current (DC) magnetron sputtering on microstructure evolution of TiN coating, in comparison to conventional DC sputtering. The implementation of a pulsed DC voltage profile promotes a drastic texture change from randomly oriented polycrystals to (1 1 1) textured TiN coatings across the full range of pulse frequencies on various Si substrates, including amorphous SiO₂. Additionally, higher pulse frequencies promote significant grain size reduction, accompanied with corresponding increases in hardness and wear resistance. The potential mechanism for this microstructural and texture evolution is also explored.

Original language	English
Article number	157709
Journal	Applied Surface Science
Volume	635
DOIs	https://doi.org/10.1016/j.apsusc.2023.157709
State	Published - Oct 30 2023

Funding

This work is supported by Advanced Energy Industries, Inc. The ASTAR crystal orientation system in TEM microscope is supported by ONR-DURIP award N00014-17-1-2921. J. B. and H.W. acknowledge the support from the U.S. National Science Foundation (DMR-2016453) for the related nitride film property measurements. We would also like to acknowledge the microscopy center of the School of Materials Engineering at Purdue University. This work is supported by Advanced Energy Industries, Inc. The ASTAR crystal orientation system in TEM microscope is supported by ONR-DURIP award N00014-17-1-2921. J. B. and H.W. acknowledge the support from the U.S. National Science Foundation (DMR-2016453) for the related nitride film property measurements. We would also like to acknowledge the microscopy center of the School of Materials Engineering at Purdue University.

Keywords

Nanoscratch testing
Pulse DC magnetron sputtering
Titanium nitride
Transmission electron microscopy

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10.1016/j.apsusc.2023.157709

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title = "Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering",

abstract = "Titanium nitride (TiN) coatings fabricated through reactive sputtering feature a suite of parameters capable of altering the microstructure and properties. Here, we explore the influence of bipolar pulsed direct current (DC) magnetron sputtering on microstructure evolution of TiN coating, in comparison to conventional DC sputtering. The implementation of a pulsed DC voltage profile promotes a drastic texture change from randomly oriented polycrystals to (1 1 1) textured TiN coatings across the full range of pulse frequencies on various Si substrates, including amorphous SiO2. Additionally, higher pulse frequencies promote significant grain size reduction, accompanied with corresponding increases in hardness and wear resistance. The potential mechanism for this microstructural and texture evolution is also explored.",

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AU - Richter, N. A.

AU - Yang, B.

AU - Barnard, J. P.

AU - Niu, T.

AU - Sheng, X.

AU - Shaw, D.

AU - Watanabe, M.

AU - Rane, G.

AU - Krause, U.

AU - Dürrenfeld, P.

AU - Wang, H.

AU - Zhang, X.

PY - 2023/10/30

Y1 - 2023/10/30

N2 - Titanium nitride (TiN) coatings fabricated through reactive sputtering feature a suite of parameters capable of altering the microstructure and properties. Here, we explore the influence of bipolar pulsed direct current (DC) magnetron sputtering on microstructure evolution of TiN coating, in comparison to conventional DC sputtering. The implementation of a pulsed DC voltage profile promotes a drastic texture change from randomly oriented polycrystals to (1 1 1) textured TiN coatings across the full range of pulse frequencies on various Si substrates, including amorphous SiO2. Additionally, higher pulse frequencies promote significant grain size reduction, accompanied with corresponding increases in hardness and wear resistance. The potential mechanism for this microstructural and texture evolution is also explored.

AB - Titanium nitride (TiN) coatings fabricated through reactive sputtering feature a suite of parameters capable of altering the microstructure and properties. Here, we explore the influence of bipolar pulsed direct current (DC) magnetron sputtering on microstructure evolution of TiN coating, in comparison to conventional DC sputtering. The implementation of a pulsed DC voltage profile promotes a drastic texture change from randomly oriented polycrystals to (1 1 1) textured TiN coatings across the full range of pulse frequencies on various Si substrates, including amorphous SiO2. Additionally, higher pulse frequencies promote significant grain size reduction, accompanied with corresponding increases in hardness and wear resistance. The potential mechanism for this microstructural and texture evolution is also explored.

KW - Nanoscratch testing

KW - Pulse DC magnetron sputtering

KW - Titanium nitride

KW - Transmission electron microscopy

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DO - 10.1016/j.apsusc.2023.157709

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VL - 635

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Significant texture and wear resistance improvement of TiN coatings using pulsed DC magnetron sputtering

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Keywords

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