Abstract
In photonics and emerging fields of quantum and topological materials, increasing demands are placed upon the state and control of electromagnetic fields. Dielectric multilayer materials may be designed and optimized to possess extremely sharp spectral and angular photonic resonances allowing for the creation of fields orders of magnitude larger than the exciting field. With enhancements of 104 and higher, the extreme nature of these resonances places high constraints on the statistical properties of the physical and optical characteristics of the materials. To what extent the spectral and angular shifts occur as a result of fluctuations in the refractive indices and morphologies of the involved low-loss subdomains have not been considered previously. Here, we present how parameter variations such as those caused by fluctuations in deposition rate, yielding bias, random and compensated errors, may affect the resonance properties of low-loss all-dielectric stacks.
Original language | English |
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Pages (from-to) | 30654-30668 |
Number of pages | 15 |
Journal | Optics Express |
Volume | 27 |
Issue number | 21 |
DOIs | |
State | Published - Oct 14 2019 |
Funding
The authors acknowledge the PSA group for financial support of this work, the ANRT for their support through the CIFRE program and the RCMO Group of the Institut Fresnel for the realization of the coatings. The authors also acknowledge the CNRS and the Aix-Marseille Université. A. P. acknowledges support from the laboratory directed research and development (LDRD) program at the Oak Ridge National Laboratory (ORNL). This work is part of the OpenLab PSA/AMU: Automotive Motion Lab through the StelLab network.
Funders | Funder number |
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Institut Fresnel | |
Oak Ridge National Laboratory | |
Aix-Marseille Université | |
Association Nationale de la Recherche et de la Technologie | |
Centre National de la Recherche Scientifique |