Sensitivity of resonance properties of all-dielectric multilayers driven by statistical fluctuations

A. L. Lereu, F. Lemarchand, M. Zerrad, D. Niu, V. Aubry, A. Passian, C. Amra

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

In photonics and emerging fields of quantum and topological materials, increasing demands are placed upon the state and control of electromagnetic fields. Dielectric multilayer materials may be designed and optimized to possess extremely sharp spectral and angular photonic resonances allowing for the creation of fields orders of magnitude larger than the exciting field. With enhancements of 104 and higher, the extreme nature of these resonances places high constraints on the statistical properties of the physical and optical characteristics of the materials. To what extent the spectral and angular shifts occur as a result of fluctuations in the refractive indices and morphologies of the involved low-loss subdomains have not been considered previously. Here, we present how parameter variations such as those caused by fluctuations in deposition rate, yielding bias, random and compensated errors, may affect the resonance properties of low-loss all-dielectric stacks.

Original languageEnglish
Pages (from-to)30654-30668
Number of pages15
JournalOptics Express
Volume27
Issue number21
DOIs
StatePublished - Oct 14 2019

Funding

The authors acknowledge the PSA group for financial support of this work, the ANRT for their support through the CIFRE program and the RCMO Group of the Institut Fresnel for the realization of the coatings. The authors also acknowledge the CNRS and the Aix-Marseille Université. A. P. acknowledges support from the laboratory directed research and development (LDRD) program at the Oak Ridge National Laboratory (ORNL). This work is part of the OpenLab PSA/AMU: Automotive Motion Lab through the StelLab network.

FundersFunder number
Institut Fresnel
Oak Ridge National Laboratory
Aix-Marseille Université
Association Nationale de la Recherche et de la Technologie
Centre National de la Recherche Scientifique

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