Response of superconducting characteristics of Hg-based high-Τc thin films to photolithographic processes

T. Aytug, Y. Yu, S. L. Yan, Y. Y. Xie, J. Z. Wu

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The stability of the properties of Hg-based superconducting thin films has been studied during conventional photolithographic patterning processes. The patterning process was divided into individual steps such as photoresist baking, developing and etching in order to observe the effect of each step separately on the superconducting properties of the samples. After baking of the photoresist, a considerable degradation in the superconducting properties was observed, while samples did not show any visible degradation after they were etched with acid solution.

Original languageEnglish
Pages (from-to)56-60
Number of pages5
JournalPhysica C: Superconductivity and its Applications
Volume325
Issue number1-2
DOIs
StatePublished - Nov 10 1999

Funding

We thank Dr. D.K. Christen for his helpful discussions and for reviewing this manuscript. This work is supported in part by USAFOSR Grant No. F49620-96-1-0358, NSF Grant No. DMR-9632279 and NSF EPSCoR fund.

Keywords

  • Hg-1212
  • High-temperature superconductivity
  • Photolithography
  • Stability

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