TY - JOUR
T1 - Reduced Graphene Oxide Decorated Titanium Nitride Nanorod Array Electrodes for Electrochemical Applications
AU - Islam, Md Shafiul
AU - Branigan, Alan
AU - Ye, Dexian
AU - Collinson, Maryanne M.
N1 - Publisher Copyright:
© 2024 by the authors.
PY - 2024/9
Y1 - 2024/9
N2 - This work describes the fabrication and characterization of a new high surface area nanocomposite electrode containing reduced graphene oxide (rGO) and titanium nitride (TiN) for electrochemical applications. This approach involves electrochemically depositing rGO on a high surface area TiN nanorod array electrode to form a new nanocomposite electrode. The TiN nanorod array was first formed by the glancing angle deposition technique in a DC (Direct Current) sputtering system. GO flakes of ~1.5 μm in diameter, as confirmed by Dynamic Light Scattering (DLS), were electrodeposited on the nanostructured TiN electrode via the application of a fixed potential for one hour. The surface morphology of the as-prepared rGO/TiN electrode was evaluated by scanning electron microscopy (SEM) and the presence of rGO on TiN was confirmed by Raman Microscopy. The CV shows an increase in the capacitive current at rGO/TiN as compared to TiN. The rGO decorated TiN electrode was then used for analyzing the electrocatalytic oxidation of ascorbic acid and dopamine, and the reduction of nitrate by CV and linear sweep voltammetry (LSV), respectively. CV or LSV show that the electrochemical kinetics of these three analytes are significantly faster on rGO/TiN than TiN itself. Overall, the rGO/TiN electrode showed better electrochemical behavior for biomolecules like ascorbic acid and dopamine as well as another target analyte, nitrate ions, compared to TiN by itself.
AB - This work describes the fabrication and characterization of a new high surface area nanocomposite electrode containing reduced graphene oxide (rGO) and titanium nitride (TiN) for electrochemical applications. This approach involves electrochemically depositing rGO on a high surface area TiN nanorod array electrode to form a new nanocomposite electrode. The TiN nanorod array was first formed by the glancing angle deposition technique in a DC (Direct Current) sputtering system. GO flakes of ~1.5 μm in diameter, as confirmed by Dynamic Light Scattering (DLS), were electrodeposited on the nanostructured TiN electrode via the application of a fixed potential for one hour. The surface morphology of the as-prepared rGO/TiN electrode was evaluated by scanning electron microscopy (SEM) and the presence of rGO on TiN was confirmed by Raman Microscopy. The CV shows an increase in the capacitive current at rGO/TiN as compared to TiN. The rGO decorated TiN electrode was then used for analyzing the electrocatalytic oxidation of ascorbic acid and dopamine, and the reduction of nitrate by CV and linear sweep voltammetry (LSV), respectively. CV or LSV show that the electrochemical kinetics of these three analytes are significantly faster on rGO/TiN than TiN itself. Overall, the rGO/TiN electrode showed better electrochemical behavior for biomolecules like ascorbic acid and dopamine as well as another target analyte, nitrate ions, compared to TiN by itself.
KW - electroanalysis
KW - electrodeposition
KW - glancing angle deposition (GLAD)
KW - nanocomposite
KW - reduced graphene oxide
KW - TiN
UR - http://www.scopus.com/inward/record.url?scp=85205059418&partnerID=8YFLogxK
U2 - 10.3390/electrochem5030017
DO - 10.3390/electrochem5030017
M3 - Article
AN - SCOPUS:85205059418
SN - 2673-3293
VL - 5
SP - 274
EP - 286
JO - Electrochem
JF - Electrochem
IS - 3
ER -