Recent advances in gaseous dielectrics at oak ridge national laboratory

Recent developments in gaseous dielectrics are discussed with emphasis on dielectric gas mixtures containing SF6. Recent findings on the isotopic, pressure, and nonuniform field dependence of the dielectric strength of gases are also presented, and ways to enhance the corona-stabi1ization characteristics of gas mixtures by appropriate additives (e. g. to SF6) are outlined. In addition, results are presented on the spark decomposition products of SF6 and the alleviation of the harmful effects of conducting particles by particle coating in situ. Finally, electron attachment, electron drift velocity, and breakdown properties of gas mixtures (e.g. C2F6 or C3F8 in Ar or CH4) - comprised of electron attaching and electron conductivity enhancing components - which have promise for use in pulsed power technologies are reported.