Abstract
A method to measure the aberration function for a crystalline specimen from a single inline hologram or 'Ronchigram' by dividing it up into small patches is derived. Measurement of aberrations is demonstrated from both dynamical simulations and experimental Ronchigrams. This method should allow rapid fine-tuning on a variety of crystalline specimens and represents a key step toward active optics for scanning transmission electron microscopy.
| Original language | English |
|---|---|
| Pages (from-to) | 195-201 |
| Number of pages | 7 |
| Journal | Journal of Electron Microscopy |
| Volume | 57 |
| Issue number | 6 |
| DOIs | |
| State | Published - Dec 2008 |
Funding
The research was supported by the Division of Materials Science and Engineering of the U.S. Department of Energy. Some of the instrumentation used in this research was provided as part of the TEAM project, funded by the Department of Energy, Office of Science. Critical comments from several colleagues, including Drs. Nellist, Krivanek, Ramasse and Kenik, and the reviewers are gratefully acknowledged.
| Funders | Funder number |
|---|---|
| Division of Materials Science and Engineering | |
| U.S. Department of Energy | |
| Office of Science |
Keywords
- Aberration correction
- Aberration measurement
- Cs
- Ronchigram
- STEM