Abstract
Pulsed electron deposition (PED), an ablation-based film growth technique similar to pulsed-laser deposition, is a relatively new method for the physical vapor deposition (PVD) of films. In the area of PVD ex situ superconductor precursor deposition, PED is potentially simpler and more versatile than its traditional e-beam co-evaporation counterpart. We have deposited near-stoichiometric YF3-BaF2-CuO PED precursors of various thicknesses in moving configuration on RABiTS substrates. Critical current densities (Jc) as high as 1.6 MA/cm2 have been achieved on these precursors converted at standard slow rates of roughly 1 Å/s, which has previously been necessary for high performance PVD precursors. More importantly, these as-deposited PED precursors were found to be able to tolerate aggressive conversion conditions. Consequently, simultaneous attainment of high conversion rate of nearly 8 Å/s and high Jc of 1 MA/cm 2 has been realized.
Original language | English |
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Pages (from-to) | 878-886 |
Number of pages | 9 |
Journal | Physica C: Superconductivity and its Applications |
Volume | 426-431 |
Issue number | II |
DOIs | |
State | Published - 2005 |
Event | Proceedings of the 17th Internatioanl Symposium on Superconductivity (ISS 2004) Advances in Superconductivity - Duration: Nov 23 2004 → Nov 25 2004 |
Funding
The authors would like to thank American Superconductor Corporation for the supply of RABiTS, and Neocera, Inc. for their support with the PED process. Research sponsored by the DOE Office of Electricity Delivery and Energy Reliability, under contract DE-AC05-00OR22725 with UT-Battelle, LLC, managing contractor for Oak Ridge National Laboratory.
Funders | Funder number |
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Office of Electricity Delivery and Energy Reliability | DE-AC05-00OR22725 |
Oak Ridge National Laboratory |
Keywords
- Coated conductors
- Epitaxy
- Ex situ
- Reaction rates
- Thin films