Abstract
A radio frequency (rf) powered glow discharge atomization/ionization source has been developed for solids mass spectrometry. By use of a 13.56-MHz generator to supply the discharge operating potential, a pseudocontinuous plasma is produced that permits the sputtering of electrically Insulating materials such as glasses and ceramics. The rf-powered source operates at argon pressures of 100–500 mTorr and powers of 5–50 W. The effect of discharge parameters on the observed analyte ion signals Is explained in part as a spatial, ion sampling effect. Mass spectra are presented for alloy, metal oxide, and glass matrix samples. For each of the matrix types, analyte ion currents for the major species are on the order of 10-11A, a value similar to those observed In the conventional dc glow discharge ion sources.
Original language | English |
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Pages (from-to) | 1879-1886 |
Number of pages | 8 |
Journal | Analytical Chemistry |
Volume | 61 |
Issue number | 17 |
DOIs | |
State | Published - Sep 1989 |
Externally published | Yes |